adamantane-1,3-dicarboxylic acid di-t-butyl ester | 169228-97-1

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: adamantane-1,3-dicarboxylic acid di-t-butyl ester
• 英文别名: 1,3-di(t-butoxycarbonyl)adamantane；1,3-adamantanedicarboxylic di-t-butyl ester；ditert-butyl adamantane-1,3-dicarboxylate
• CAS: 169228-97-1
• 化学式: C₂₀H₃₂O₄
• 分子量: 336.472
• InChiKey: HWMSLBURLAFGAO-UHFFFAOYSA-N

物化性质

• 沸点：
  392.4±15.0 °C(Predicted)
• 密度：
  1.109±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.7
• 重原子数：
  24
• 可旋转键数：
  6
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  adamantane-1,3-dicarboxylic acid di-t-butyl ester 、 、 氧气 在 NHPI 作用下， 以 溶剂黄146 为溶剂， 反应 6.0h， 以As a result, there was obtained 1,3-di(t-butoxycarbonyl)-5-hydroxyadamantane的产率得到1,3-di(t-butoxycarbonyl)-5-hydroxyadamantane
  参考文献：
  名称：

  Compounds for photoresist and resin composition for photoresist

  摘要：

  这个光阻树脂组合物包括一个聚合物，其具有以下公式所表示的金刚烷骨架和一个光活性酸前体：其中R1代表氢原子或甲基基团；R2、R3和R4相同或不同，每个代表氢原子、卤素原子、烷基、羟基、羟甲基基团、羧基、通过酸催化消除生成羟基、羟甲基基团或羧基的官能团；R2到R4中至少有一个是上述定义的官能团；X代表酯键或酰胺键；m和n中的每一个都是0或1。上述光阻树脂组合物对蚀刻溶液具有高度抗性，可通过光照溶解，并能够形成微小图案。

  公开号：

  US06391520B1
• 作为产物：
  描述：

  1,3-金刚烷二甲酸 以 异丁烯 为溶剂， 生成 adamantane-1,3-dicarboxylic acid di-t-butyl ester
  参考文献：
  名称：

  Compounds for photoresist and resin composition for photoresist

  摘要：

  光阻树脂组合物包括具有以下结构的金刚烷骨架的聚合物和光活性酸前体：其中R1代表氢原子或甲基基团；R2、R3和R4相同或不同，分别代表氢原子、卤素原子、烷基基团、羟基、羟甲基基团、羧基、通过酸消除形成羟基、羟甲基基团或羧基的官能团；R2至R4中至少有一个是上述定义的官能团；X代表酯键或酰胺键；m和n各自为0或1。上述光阻树脂组合物对蚀刻溶液具有很高的抗性，可以通过光照溶解，并能够形成微小图案。

  公开号：

  US06391520B1

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT
  申请人：MATSUDA Yasuhiko

  公开号：US20130065186A1

  公开（公告）日：2013-03-14

  A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R 2 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R 1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO 3 or SO 2 . R 2 represents a cyclic hydrocarbon group. R 3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3. Z—R 1 —X—R 2 —(R 3 ) n (I) —R 31 -G-R 13 (x)

  一种辐射敏感树脂组合物包括酸发生剂，通过放射性射线照射生成有机酸。该有机酸具有环烃基和有机基，包括可被酸或碱裂解以产生极性基团的键。有机酸最好由以下式（I）表示。其中，Z代表有机酸基团。R2代表脂肪二元基，其中R1代表脂肪二元基中的一部分或全部氢原子可选地被氟原子取代。X代表单键，O，OCO，COO，CO，SO3或SO2。R2代表环烃基。R3代表具有以下式（x）所表示的官能团的一价有机基。n为1到3的整数。Z-R1-X-R2-(R3)n（I）-R31-G-R13（x）。
• Process for producing t-butyl esters of bridged-ring polycarboxylic acids
  申请人：Daicel Chemical Industries, Ltd.

  公开号：US06515165B1

  公开（公告）日：2003-02-04

  In a process of the present invention for producing a bridged cyclic polycarboxylic acid t-butyl ester, a bridged cyclic polycarboxylic halide of following Formula (1): (wherein ring Z is a bridged cyclic carbon ring; X is a halogen atom; and m denotes an integer of 2 or more, where ring Z may have a substituent) is allowed to react with t-butyl alcohol or its alkali metal salt to thereby yield an ester of following Formula (2): (wherein tBu is a t-butyl group; and ring Z and m have the same meanings as defined above.) This process can commercially efficiently produce a bridged cyclic polycarboxylic acid t-butyl ester. The compound of Formula (1) can be prepared by allowing a bridged cyclic polycarboxylic acid of following Formula (3): (wherein ring Z is a bridged cyclic carbon ring; and m denotes an integer of 2 or more, where ring Z may have a substituent) to react with a halogenating agent.

  在本发明的生产桥环多羧酸t-叔丁基酯的过程中，将下式（1）的桥环多羧酸卤代物（其中环Z为桥环碳环；X为卤素原子；m表示2或更多的整数，其中环Z可能有取代基）与t-叔丁醇或其金属盐反应，从而产生下式（2）的酯（其中tBu为t-叔丁基团；环Z和m具有上述定义的相同含义）。这个过程可以高效地商业化生产桥环多羧酸t-叔丁基酯。式（1）的化合物可以通过让下式（3）的桥环多羧酸（其中环Z为桥环碳环；m表示2或更多的整数，其中环Z可能有取代基）与卤代试剂反应来制备。
• RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND PRODUCING METHOD OF COMPOUND
  申请人：MARUYAMA Ken

  公开号：US20120258399A1

  公开（公告）日：2012-10-11

  A radiation-sensitive resin composition includes a compound shown by a following general formula (A), a solvent and a resin having an acid-labile group. Each of R 1 and R 2 independently represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 25 carbon atoms. Each of X and Z independently represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 25 carbon atoms. Y represents a single bond or the like. n represents an integer from 0 to 5.

  一种辐射敏感性树脂组合物包括以下通式（A）所示的化合物，溶剂和具有酸敏感基团的树脂。其中，R1和R2各自独立地表示具有1到25个碳原子的取代或未取代的一价烃基。X和Z各自独立地表示具有1到25个碳原子的取代或未取代的二价烃基。Y表示单键或类似物。n表示从0到5的整数。
• Radiation-sensitive resin composition
  申请人：——

  公开号：US20020009668A1

  公开（公告）日：2002-01-24

  A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), 1 wherein R 1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X 1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R 2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.

  公开了一种辐射敏感的树脂组合物，包括一个含有酸敏感基团的树脂和一个光酸发生剂。该树脂的结构式为(1)，其中R1代表氢原子、一价酸敏感基团、不含酸敏感基团的1-6个碳原子的烷基或不含酸敏感基团的2-7个碳原子的烷基酰基，X1代表线性或支链的含有1-4个碳原子的氟化烷基，R2代表氢原子、含有1-10个碳原子的线性或支链烷基，或含有1-10个碳原子的线性或支链氟化烷基。该树脂组合物表现出辐射的高透过率、高敏感度、分辨率和图案形状，可用于在高产率下生产半导体中的化学放大图案。
• HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD
  申请人：Tanaka Yuko

  公开号：US20110198730A1

  公开（公告）日：2011-08-18

  A method of synthesizing a hyperbranched polymer by living radical polymerization of a monomer in the presence of a metal catalyst includes at least adding a compound or setting the amount of the monomer in the living radical polymerization. The compound added is at least a compound represented by R 1 -A or a compound represented by R 2 —B—R 3 , where R 1 denotes hydrogen, an alkyl group (1-10 carbons), aryl group (1-10 carbons), or aralkyl group (7-10 carbons), A denotes a cyano group, hydroxyl group, or nitro group, R 2 and R 3 denote hydrogen, alkyl groups (1-10 carbons), aryl groups (6-10 carbons), aralkyl groups (7-10 carbons), or dialkylamino groups (2-10 carbons), and B denotes a carbonyl group or sulfonyl group. Setting of the monomer amount includes setting the amount of monomer to be mixed into a reaction system at one mixing to be less than the total monomer to be mixed with the reaction system.

  在金属催化剂的存在下，通过活性自由基聚合合成超支化聚合物的方法，至少包括添加化合物或调整活性自由基聚合中单体的量。添加的化合物至少是由R1-A表示的化合物或由R2-B-R3表示的化合物，其中R1表示氢、烷基（1-10个碳）、芳基（1-10个碳）或芳基烷基（7-10个碳），A表示氰基、羟基或硝基，R2和R3表示氢、烷基（1-10个碳）、芳基（6-10个碳）、芳基烷基（7-10个碳）或二烷基氨基基团（2-10个碳），B表示羰基或磺酰基。单体量的调整包括将单体的量设置为在一次混合中混合到反应体系中的单体总量以下。