4-methyl-6-oxabicyclo<3.2.1>octan-7-one | 76170-66-6

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 4-methyl-6-oxabicyclo<3.2.1>octan-7-one
• 英文别名: 4-methyl-6-oxa-bicyclo[3.2.1]octan-7-one；4-Methyl-6-oxa-bicyclo[3.2.1]octan-7-on；3-Hydroxy-4-methyl-cyclohexancarbonsaeure-lacton；4-Methyl-6-oxabicyclo[3.2.1]octan-7-one
• CAS: 76170-66-6
• 化学式: C₈H₁₂O₂
• 分子量: 140.182
• InChiKey: NWTZCLBLJUMDTI-UHFFFAOYSA-N

物化性质

• 熔点：
  68-69 °C
• 沸点：
  101-102 °C(Press: 5 Torr)
• 密度：
  1.074±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  10
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  4-methyl-6-oxabicyclo<3.2.1>octan-7-one 、 水 生成 alkaline earth salt of/the/ methylsulfuric acid
  参考文献：
  名称：

  Meldrum; Perkin, Journal of the Chemical Society, 1908, vol. 93, p. 1419

  摘要：

  DOI：
• 作为产物：
  描述：

  alkaline earth salt of/the/ methylsulfuric acid 生成 4-methyl-6-oxabicyclo<3.2.1>octan-7-one
  参考文献：
  名称：

  Meldrum; Perkin, Journal of the Chemical Society, 1908, vol. 93, p. 1419

  摘要：

  DOI：

文献信息

• Salt suitable for an acid generator and a chemically amplified resist composition containing the same
  申请人：Harada Yukako

  公开号：US20070078269A1

  公开（公告）日：2007-04-05

  The present invention provides a salt of the formula (I): wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one —CH 2 — group is substituted with —COO— group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q 1 and Q 2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A + represents organic counter ion; and n shows an integer of 0 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

  本发明提供了一种具有公式(I)的盐： 其中环Y代表具有3至30个碳原子的单环或多元环烃基团，其中一个—CH2—基团被—COO—基团取代，并且单环或多元环烃基团中的至少一个氢原子可以可选地被具有1至6个碳原子的烷基取代，具有1至6个碳原子的烷氧基，具有1至4个碳原子的全氟烷基，具有1至6个碳原子的羟基烷基，羟基或腈基；Q1和Q2各自独立地代表氟原子或具有1至6个碳原子的全氟烷基；A+代表有机反离子；n表示0至12的整数。 本发明还提供了一种含有公式(I)盐的化学放大抗蚀剂组合物。
• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：Ichikawa Koji

  公开号：US20110014566A1

  公开（公告）日：2011-01-20

  A salt represented by the formula (I-Pa): wherein X pa represents a single bond or a C1-C4 alkylene group, R pa represents a single bond, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—, Y pa represents a polymerizable group, and Z pa+ represents an organic cation.

  由公式(I-Pa)表示的盐，其中Xpa代表单一键或C1-C4亚烷基团，Rpa代表单一键、C4-C36二价脂环烃基团或C6-C36二价芳香烃基团，且脂环烃基团中的一个或多个亚甲基基团可以被—O—或—CO—替换，Ypa代表可聚合团，Zpa+代表有机阳离子。
• CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS
  申请人：Ohsawa Youichi

  公开号：US20130034813A1

  公开（公告）日：2013-02-07

  A chemically amplified positive resist composition comprising (A) a sulfonium salt of 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylpropionic acid, (B) an acid generator, (C) a base resin, and (D) an organic solvent is suited for ArF immersion lithography. The carboxylic acid sulfonium salt is highly hydrophobic and little leached out in immersion water. By virtue of controlled acid diffusion, a pattern profile with high resolution can be constructed.

  一种化学增感正型光刻胶组合物，包括（A）三氟甲基-3,3,3-三氟-2-羟基-2-丙酸磺酸盐，（B）酸发生剂，（C）碱性树脂和（D）有机溶剂，适用于ArF浸没光刻。羧酸磺酸盐具有高度疏水性，在浸没水中几乎不溶出。通过控制酸扩散，可以构建具有高分辨率的图案轮廓。
• Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Harada Yukako

  公开号：US20080081293A1

  公开（公告）日：2008-04-03

  The present invention provides a salt represented by the formula (I): wherein P 1 , P 2 and P 3 each independently represent a C1-C30 alkyl group which may be substituted with at least one selected from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-C12 alkoxy group, or a C3-C30 cyclic hydrocarbon group which may be substituted with at least one selected from a hydroxyl group and a C1-C12 alkoxy group, provided that all of P 1 , P 2 and P 3 are not simultaneously phenyl groups which may be substituted, Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and R represents a group represented by the formula: wherein A 1 represents —OH or —Y 1 —OH, n represents an integer of 1 to 9, and Y 1 represents a divalent C1-C6 saturated aliphatic hydrocarbon group; a group represented by the formula: wherein ring X 1 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which one —CH 2 — group is substituted with —CO—, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group; a group represented by the formula: wherein ring X 2 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which a hydrogen atom of one —CH 2 — group is substituted with a hydroxyl group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group; a group represented by the formula: wherein ring X 3 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which one —CH 2 — group is substituted with —COO—, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group, and m represents an integer of 0 to 12; or a group represented by the formula: wherein ring X 4 represents a C6-C30 polycyclic hydrocarbon group having tricycle or more, and at least one hydrogen atom in the polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group or a cyano group, and l represents an integer of 1 to 12. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

  本发明提供了一种盐，其表示为公式（I）：其中P1、P2和P3各自独立地表示一个C1-C30烷基基团，该基团可以被至少一个羟基、一个C3-C12环烃基团和一个C1-C12烷氧基中的至少一个取代，或者一个C3-C30环烃基团，该基团可以被至少一个羟基和一个C1-C12烷氧基中的至少一个取代，前提是P1、P2和P3均不同时为可以被取代的苯基；Q1和Q2各自独立地表示氟原子或者C1-C6全氟烷基基团，R表示由以下公式表示的一个基团：其中A1表示—OH或—Y1—OH，n表示1到9之间的整数，Y1表示二价的C1-C6饱和脂肪族碳氢基团；一个由以下公式表示的基团：其中环X1表示一个C3-C30的单环或多环碳氢基团，其中一个—CH2—基团被—CO—取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代；一个由以下公式表示的基团：其中环X2表示一个C3-C30的单环或多环碳氢基团，其中一个—CH2—基团的氢原子被羟基取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代；一个由以下公式表示的基团：其中环X3表示一个C3-C30的单环或多环碳氢基团，其中一个—CH2—基团被—COO—取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代，m表示0到12之间的整数；或者一个由以下公式表示的基团：其中环X4表示一个具有三环或更多的C6-C30多环碳氢基团，多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团或氰基取代，l表示1到12之间的整数。本发明还提供了一种化学增感抗蚀组合物，其包含上述公式（I）表示的盐。
• SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：ICHIKAWA Koji

  公开号：US20130040239A1

  公开（公告）日：2013-02-14

  A salt represented by formula (I): wherein Q 1 , Q 2 , L 1 , W, and Z + are defined in the specification.

  由公式（I）代表的一种盐：其中Q1、Q2、L1、W和Z+在说明书中定义。