A deprotection procedure using SO<sub>3</sub>H silica gel to remove non-silyl protecting groups
作者:Fumika Karaki、Miki Kuwada、Saki Tajiri、Misaki Kanda、Mari Yanai、Mitsuhiro Kamimura、Kennosuke Itoh、Hideaki Fujii
DOI:10.1080/00397911.2018.1548023
日期:2019.1.17
Pivaloyloxy, benzyloxy and methoxy carbonyl groups remained intact and selective deprotection of TBS groups in the presence of other protecting groups was accomplished. We succeeded in cleaving an acetyl group on a secondary alcohol in a highly polar nortropine derivative. Our findings here provide another deprotection option and would be helpful in the synthesis of multifunctional compounds. Graphical Abstract
摘要 保护基团在有机合成中是必不可少的,对各种脱保护方法的需求很大。在这里,我们研究了使用 SO3H 硅胶的脱保护程序的应用范围,我们之前已将其报告为脱甲硅烷化程序。在这些条件下,-OMOM、-OSEM、-OTHP 和-OAc 基团和二甲基乙缩醛被裂解。新戊酰氧基、苄氧基和甲氧基羰基保持完整,并且在其他保护基团存在下实现了 TBS 基团的选择性脱保护。我们成功地裂解了高极性去甲托品衍生物中仲醇上的乙酰基。我们的发现提供了另一种脱保护选择,将有助于多功能化合物的合成。图形概要