Monomers and polymers are provided that comprise a carbon alicyclic group or heteroalicyclic group that comprises 1) one or more acid-labile ring substituents and 2) one or more ether or thioether ring substituents. Photoresists that comprise such polymers also are provided.
本发明提供了包含碳脂环基团或杂脂环基团的单体和聚合物,这些碳脂环基团或杂脂环基团包含 1) 一个或多个耐酸环取代基和 2) 一个或多个醚或
硫醚环取代基。 此外,还提供了包含此类聚合物的光致抗蚀剂。