1-(2-Propoxy-ethoxy)-pentane | 18854-60-9

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-(2-Propoxy-ethoxy)-pentane
• 英文别名: 1-(2-Propoxyethoxy)pentane
• CAS: 18854-60-9
• 化学式: C₁₀H₂₂O₂
• 分子量: 174.283
• InChiKey: PDKJACXZLHIRMN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  12
• 可旋转键数：
  9
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• KONDENSATIONSPRODUKTE AUF BASIS VON KOLOPHONIUM-MALEINIMIDEN
  申请人：BASF Lacke + Farben AG

  公开号：EP0444065A1

  公开（公告）日：1991-09-04
• OPTICAL FILM, CIRCULARLY POLARIZING PLATE, AND IMAGE DISPLAY DEVICE
  申请人：Fujisawa Rie

  公开号：US20150247963A1

  公开（公告）日：2015-09-03

  A optical film includes a thermoplastic resin and a compound wherein: (1) the absorption spectrum of said compound in solution has at least two absorption maxima in the 200-350 nm wavelength range; (2) letting λmax 1 represent the wavelength of a first absorption maximum (one of the aforementioned absorption maxima) and letting λmax 2 represent the wavelength of a second absorption maximum (another of the aforementioned absorption maxima) at a shorter wavelength than the first absorption maximum, (λmax 1 −λmax 2 ) is at least 20 nm; (3) the aspect ratio of the molecules of the compound is at least 1.70; (4) each molecule of the compound has a non-aromatic hydrocarbon ring, a non-aromatic heterocycle, or an aromatic heterocycle; (5) the in-plane-retardation increase sensitivity of the compound is at least 0.1; 110 nm≦R 0 (550)≦170 nm; 0.72≦R 0 (450)/R 0 (550)≦0.96; and 0.83≦R 0 (550)/R 0 (650)≦0.97.
• RESIST COMPOSITION FOR PATTERN PRINTING AND PATTERN FORMING METHOD
  申请人：KANEKA CORPORATION

  公开号：US20210114967A1

  公开（公告）日：2021-04-22

  A resist composition for pattern printing contains a binder, a filler, a thickener, and a polyfunctional (meth)acrylate. The resist composition does not contain a photoinitiator. The resist composition also contains photocatalytic titanium oxide. A method for forming a pattern includes a resist composition that is pattern-wise printed, and then the resist composition is irradiated with an actinic radiation such that seepage of the resist component from an end of the pattern during the pattern formation using the resist composition is suppressed and the seepage portion is decomposed. As a result, it is possible to drastically reduce the seepage without impairing the rheology of the resist composition and additionally, to remove a slightly seeping portion without requiring, for example, a harmful ozone treatment or the like.
• US9500790B2
  申请人：——

  公开号：US9500790B2

  公开（公告）日：2016-11-22
• [EN] CONDENSATION PRODUCTS BASED ON COLOPHONIUM MALEIC IMIDES
  申请人：——

  公开号：WO1990005158A1

  公开（公告）日：1990-05-17

  [FR] On obtient lesdits produits par (A) transformation de 100 parties en poids de colophane avec entre 1 et 20 parties en poids d'anhydride d'acide maléique à une température comprise entre 150 et 250°C; (B) retransformation du produit d'addition (A) obtenu lors de la phase (A) avec une diamine organique diprimaire à des températures comprises entre 130 et 250°C, le rapport molaire entre groupes anhydrides et groupes amino étant compris entre 0,8 et 1,2 pour 1; (C) retransformation du produit de condensation (B) obtenu lors de la phase (B) avec un polyol dont la fonctionnalité est comprise entre 3 et 6 à des températures comprises entre 230 et 300°C, le rapport molaire entre groupes carboxyles et hydroxiles étant compris entre 0,7 et 1,5 pour 1.
  [EN] Condensation products based on colophonium maleic imides are obtained by A) reaction of 100 parts by weight of colophonium with 1 to 20 parts by weight of maleic anhydride at a temperature between 150 and 250C; B) reaction of the adduct (A) formed in step A with an organic diprimary amine at temperatures between 130 and 250C, in a molar ratio of anhydride groups to amino groups of 0.8 to 1.2:1; C) reaction of the condensation product (B) formed in step B with a polyalcohol of functionality 3 to 6 at temperatures between 230 and 300C, in a molar ratio of carboxylic groups to hydroxyl groups of 0.7 to 1.5:1.