a-丙酰氧基-4-丁内酯3-丙酰氧基二氢-2(3H)-呋喃酮 | 25600-22-0

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 中文名称: a-丙酰氧基-4-丁内酯3-丙酰氧基二氢-2(3H)-呋喃酮
• 中文别名: 2-丙酰氧基-4-丁内酯
• 英文名称: 3-propionyloxy-dihydro-furan-2-one
• 英文别名: (2-Oxooxolan-3-yl) propanoate
• CAS: 25600-22-0
• 化学式: C₇H₁₀O₄
• 分子量: 158.154
• InChiKey: JOUGBAUARQNKMU-UHFFFAOYSA-N

物化性质

• 沸点：
  277.6±33.0 °C(Predicted)
• 密度：
  1.18±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  11
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.71
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：NISHI Tsunehiro

  公开号：US20100062374A1

  公开（公告）日：2010-03-11

  A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R 1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.

  一种正性光刻胶组合物包括（A）在酸的作用下在碱性显影剂中变得可溶的树脂组分和（B）酸发生剂。树脂（A）是一种聚合物，包含由式（1）表示的非离去羟基的重复单元，其中R1为H、甲基或三氟甲基，X为单键或亚甲基，m为1或2，并且羟基连接到次级碳原子。当通过光刻工艺处理时，该组合物在分辨率方面得到改善。
• GENERATION OF ENDO- AND/OR EXO-NORBORNENECARBOXALDEHYDE AS AN INTERMEDIATE TO FUNCTIONALIZED NORBORNENES
  申请人：Bell Andrew

  公开号：US20090118539A1

  公开（公告）日：2009-05-07

  Embodiments in accordance with the present invention provide for forming essentially pure diastereomers of 5/6-substituted norbornene-type monomers. Further, embodiments in accordance with the present invention encompass polymerizing such diastereomers to form addition or ROMP polymers where a desired exo-/endo-ratio of the diastereomers is provided to the polymerization, such ratio designed to provide a desired ratio of endo-/exo-structured repeating units for a resulting polymer to have desired physical or chemical properties.

  根据本发明的实施例，提供形成基本纯的5/6-取代去氢莰烯型单体的异构体。此外，根据本发明的实施例涵盖聚合这种异构体以形成加成或ROMP聚合物，其中所提供给聚合反应的异构体的期望外/内比例设计为提供所得聚合物具有期望的物理或化学性质的外/内结构重复单元的期望比例。
• PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION
  申请人：Kawanishi Yasutomo

  公开号：US20080081288A1

  公开（公告）日：2008-04-03

  A photosensitive composition includes (A) a compound represented by the following formula (I): wherein R 1 to R 13 each independently represents a hydrogen atom or a substituent, Z represents a single bond or a divalent linking group, and X − represents an anion containing a proton acceptor functional group.

  一种光敏组合物包括(A) 由下式(I)所表示的化合物：其中R1至R13各自独立地表示氢原子或取代基，Z表示单键或二价连接基团，X-表示含有质子受体功能基团的阴离子。
• Lactone photoacid generators and resins and photoresists comprising same
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：EP2452941A1

  公开（公告）日：2012-05-16

  New lactone-containing photoacid generator compounds ("PAGs") and photoresist compositions that comprise such PAG compounds are provided. These photoresist compositions are useful in the manufacture of electronic devices

  提供了含有新的内酯类光酸发生剂化合物（“PAGs”）和包含这种PAG化合物的光刻胶组合物。这些光刻胶组合物在电子器件的制造中有用。
• Developer, pattern forming method, and electronic device manufacturing method
  申请人：FUJIFILM Corporation

  公开号：US10562991B2

  公开（公告）日：2020-02-18

  Provided is a pattern forming method including the successive steps of: a resist film forming step of forming a resist film using an actinic ray-sensitive or radiation-sensitive composition; an exposure step of exposing the resist film; a step of developing the exposed resist film using a developer, and a step of rinsing the developed resist film using a rinsing liquid containing an organic solvent. The developer includes a ketone-based or ether-based solvent having a branched alkyl group. The organic solvent contained in the rinsing liquid includes an ether-based solvent having a branched alkyl group.

  本发明提供了一种图案形成方法，包括以下连续步骤：使用对放热射线或辐射敏感的组合物形成抗蚀剂薄膜的抗蚀剂薄膜形成步骤；曝光抗蚀剂薄膜的曝光步骤；使用显影剂显影曝光的抗蚀剂薄膜的步骤，以及使用含有有机溶剂的漂洗液漂洗显影的抗蚀剂薄膜的步骤。显影剂包括具有支链烷基的酮基或醚基溶剂。漂洗液中的有机溶剂包括具有支链烷基的醚基溶剂。