RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
申请人:JSR CORPORATION
公开号:US20150355539A1
公开(公告)日:2015-12-10
A radiation-sensitive resin composition includes a polymer including a structural unit that includes an acid-labile group; and a compound represented by formula (1). R
1
represents a monovalent organic group having 1 to 30 carbon atoms. L represents a single bond, an oxygen atom or a sulfur atom. M
+
represents a monovalent radioactive ray-labile onium cation. The monovalent organic group represented by R
1
is preferably a monovalent hydrocarbon group or a monovalent fluorinated hydrocarbon group, and L preferably represents a single bond. The monovalent organic group represented by R
1
is preferably a monovalent hydrocarbon group, a monovalent fluorinated hydrocarbon group, a monovalent aliphatic heterocyclic group or a monovalent fluorinated aliphatic heterocyclic group, and L preferably represents an oxygen atom or a sulfur atom. The monovalent radioactive ray-labile onium cation represented by M
+
is preferably represented by the formula (X).
一种辐射敏感的树脂组合物,包括聚合物,其中包括一个结构单元,其中包括一个酸敏感基团;以及由公式(1)表示的化合物。R1表示具有1到30个碳原子的一价有机基团。L表示单键,氧原子或硫原子。M+表示一价放射性光敏离子。R1表示的一价有机基团最好是一价烃基或一价氟代烃基,而L最好表示单键。R1表示的一价有机基团最好是一价烃基,一价氟代烃基,一价脂肪族杂环基或一价氟代脂肪族杂环基,而L最好表示氧原子或硫原子。M+表示的一价放射性光敏离子最好由公式(X)表示。