1-Vinyloxy-5-acetoxy-3-oxa-pentan | 6192-14-9

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 1-Vinyloxy-5-acetoxy-3-oxa-pentan
• 英文别名: Acetoxyethoxyethylvinylether；2-(2-ethenoxyethoxy)ethyl acetate
• CAS: 6192-14-9
• 化学式: C₈H₁₄O₄
• 分子量: 174.197
• InChiKey: JRWCRXASVIGOFH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.6
• 重原子数：
  12
• 可旋转键数：
  8
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  44.8
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  1-Vinyloxy-5-acetoxy-3-oxa-pentan 在 氢氧化钾 作用下， 以 乙醇 为溶剂， 生成 1-Hydroxy-8-aethylmercapto-3.6-dioxa-octan
  参考文献：
  名称：

  Atavin,A.S. et al., Journal of Organic Chemistry USSR (English Translation), 1966, vol. 2, p. 11 - 13

  摘要：

  DOI：
• 作为产物：
  描述：

  2-acetoxyethyl vinyl ether 、 甲基丙烯酸 、 4-甲基苯磺酸吡啶 、 在 sodium hydroxide 、 水 、 magnesium sulfate 、 resultant residue 作用下， 以 二氯甲烷 为溶剂， 25.0 ℃ 、1.24 kPa 条件下， 反应 6.0h， 以there was obtained 29.6 grams of acetoxyethoxyethylvinylether (b.p. 100-105° C./0.07 mmHg)的产率得到1-Vinyloxy-5-acetoxy-3-oxa-pentan
  参考文献：
  名称：

  Photoresist, compounds for composing the photoresist, and method of

  摘要：

  提供了一种光致抗蚀剂，包括（a）由以下通式[1]表示的聚合物组成的树脂和（b）光酸发生剂，当暴露于光线时产生酸：##STR1## 其中，R1、R3和R7中的每一个表示氢原子和甲基基团中的一个，R2表示包括桥式环烃基团并具有7至13个碳原子的碳氢基团，R4表示氢原子和具有1或2个碳原子的碳氢基团中的一个，R5表示具有1或2个碳原子的碳氢基团，R6表示（a）具有1至12个碳原子的碳氢基团，（b）具有1至12个碳原子的碳氢基团并被具有1至12个碳原子的烷氧基取代，或（c）具有1至12个碳原子的碳氢基团并被具有1至13个碳原子的酰基取代，x+y+z=1，x在0.1至0.9范围内，y在0.1至0.7范围内，z在0至0.7范围内。该树脂的重量百分比在75至99.8的范围内，光酸发生剂的重量百分比在0.2至25的范围内。上述光致抗蚀剂不会通过副反应产生额外的聚合物。因此，该光致抗蚀剂具有高分辨率，从而使得形成细微图案时没有抗蚀剂残留。

  公开号：

  US05994025A1

文献信息

• Photoresists, polymers and processes for microlithography
  申请人：——

  公开号：US20040023150A1

  公开（公告）日：2004-02-05

  Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component. In other embodiments, the photoresists comprise a fluorine-containing copolymer comprising a repeat unit derived from at least one polycyclic ethylenically unsaturated compound having at least one atom or group selected from the group consisting of fluorine atom, perfluoroalkyl group, and perfluoroalkoxy group, characterized in that the at least one atom or group is covalently attached to a carbon atom which is contained within a ring structure and separated from each ethylenically unsaturated carbon atom of the ethylenically unsaturated compound by at least one covalently attached carbon atom. The photoresists have high transparency in the extreme/far UV as well as the near UV, high plasma etch resistance, and are useful for microlithography in the extreme, far, and near ultraviolet (UV) region, particularly at wavelengths ≦365 nm. Novel fluorine-containing copolymers are also disclosed.

  本文揭示了用于极端、远红外和近紫外微影的光阻及相关工艺。在某些实施例中，光阻包括（a）含有氟的共聚物，包括至少一个乙烯基不饱和化合物的重复单元，其特征在于至少一个乙烯基不饱和化合物是多环的，至少一个乙烯基不饱和化合物含有至少一个氟原子共价连接到一个乙烯基不饱和碳原子上；以及（b）至少一个光敏组分。在其他实施例中，光阻包括含有氟的共聚物，包括至少一个多环乙烯基不饱和化合物的重复单元，该乙烯基不饱和化合物具有至少一个来自氟原子、全氟烷基和全氟烷氧基的原子或基团，其特征在于至少一个原子或基团共价连接到一个环结构内的碳原子上，并且与每个乙烯基不饱和碳原子之间至少有一个共价连接的碳原子相隔开。这些光阻在极端/远红外和近紫外具有高透明度，高等离子体蚀刻抗性，并且适用于极端、远红外和近紫外（UV）区域的微影，特别是在波长≤365 nm的情况下。此外，还揭示了新型含氟共聚物。
• Protecting groups in polymers, photoresists and processes for microlithography
  申请人：——

  公开号：US20040023157A1

  公开（公告）日：2004-02-05

  The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a protecting group. A specific example of a cyclic ether group is an alkylene oxide, such as an oxetane group, substituted with one or more fluorinated alkyl groups. A specific example of a cyclic ester is a lactone which may be substituted with methyl groups. The photoresist composition further includes a photoactive component. The photoresist composition of this invention has a high transparency to ultraviolet radiation, particularly at short wavelengths such as (193) nm and (157) nm.

  本发明涉及一种光刻胶组合物，该组合物具有一个保护基团和一种包含在环状化学结构中的被保护材料。在本发明中，保护材料具有环醚基团或环酯基团作为保护基团。环醚基团的一个具体例子是被一个或多个氟化烷基取代的环氧亚烷基，如氧杂环丁烷基团。环酯的一个具体例子是可被甲基取代的内酯。光刻胶组合物还包括光活性成分。本发明的光刻胶组合物对紫外线辐射具有很高的透明度，特别是在短波长如 (193) 纳米和 (157) 纳米时。
• Fluorinated polymers having ester groups and photoresists for microlithography
  申请人：——

  公开号：US20040180287A1

  公开（公告）日：2004-09-16

  Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of esters derived from fluoroalcohol functional groups that simultaneously impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.

  本文介绍了用于微光刻技术的含氟聚合物、光刻胶和相关工艺。这些聚合物和光刻胶由源自氟醇官能团的酯类组成，同时赋予这些材料高紫外线（UV）透明度和在基本介质中的显影性。本发明的材料具有很高的紫外线透明度，特别是在短波长（如 157 纳米）下，这使得它们在这些短波长下的光刻技术中非常有用。
• Fluorinated polymers, photoresists and processes for microlithography
  申请人：——

  公开号：US20040265738A1

  公开（公告）日：2004-12-30

  Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of a fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.

  本文介绍了用于微光刻技术的含氟聚合物、光刻胶和相关工艺。这些聚合物和光刻胶由氟醇官能团组成，同时赋予这些材料高紫外线（UV）透明度和在基本介质中的显影性。本发明的材料具有很高的紫外线透明度，特别是在短波长（如 157 纳米）下，这使得它们在这些短波长下的光刻技术中非常有用。
• Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide
  申请人：Zannoni Luke

  公开号：US20050170277A1

  公开（公告）日：2005-08-04

  The present invention provides a compound that is a terpolymer of: (a) at least one ethylenically unsaturated linear or branched compound that has at least one fluorine atom covalently coupled thereto; (b) at least one ethylenically unsaturated precursor of a cyclic or polycyclic compound that has at least one fluorine atom covalently coupled thereto forming a cyclic or polycyclic decrystallizing monomer in said terpolymer; and (c) at least one ethylenically unsaturated functional compound which as a monomer in said terpolymer changes solubility upon exposure to an acid or base. Methods of making and using such compounds in photolithography are also described

  本发明提供了一种化合物，它是以下物质的三元共聚物(a) 至少一种乙烯基不饱和线性或支链化合物，其上至少有一个氟原子共价偶联； (b) 至少一种环状或多环化合物的乙烯基不饱和前体，其上至少有一个氟原子共价偶联，在所述三元共聚物中形成环状或多环解晶单体；(c) 至少一种乙烯不饱和官能团化合物，其作为所述三元共聚物中的单体，在接触酸或碱时会改变溶解度。还描述了在光刻技术中制造和使用此类化合物的方法