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3,3',5,5'-tetrakis(hydroxymethyl)biphenyl | 42601-60-5

中文名称
——
中文别名
——
英文名称
3,3',5,5'-tetrakis(hydroxymethyl)biphenyl
英文别名
[1,1'-biphenyl]-3,3',5,5'-tetrayltetramethanol;[3-[3,5-Bis(hydroxymethyl)phenyl]-5-(hydroxymethyl)phenyl]methanol
3,3',5,5'-tetrakis(hydroxymethyl)biphenyl化学式
CAS
42601-60-5
化学式
C16H18O4
mdl
——
分子量
274.317
InChiKey
UUSSHHTUXFTOKO-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    530.0±45.0 °C(Predicted)
  • 密度:
    1.306±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    0
  • 重原子数:
    20
  • 可旋转键数:
    5
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.25
  • 拓扑面积:
    80.9
  • 氢给体数:
    4
  • 氢受体数:
    4

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为反应物:
    参考文献:
    名称:
    Broad Molecular Ribbons of Nanometer Size Composed of Biphenyl Units
    摘要:
    The new tetrafunctionalized biphenyl key building blocks 16 and 39 led, for the first time, to the hitherto broadest molecular ribbons that contain biphenyl units in a transverse arrangement by iterative synthetic methods. The length and breadth of the molecular ribbons, as single chemical entities, are diversified. They can be used as cyclization precursors in the synthesis of long molecular tubes of type 2 with a large diameter. The solubility and the host-guest behavior (clathrate formation with benzene, dimethylformamide, and dichloromethane) of these nanometer-size molecular ribbons were optimized by the introduction of various side chains (benzenesulfonamide, 4-toluenesulfonamide, and 4-terf-butylbenzenesulfonamide groups) into the skeleton of the ribbons. New 14-, 15-, and 16-membered model ring systems (compounds 20a, 22a, and 24 respectively) were synthesized in order to examine the constitution of the 16-membered diaza[3.3]-phane 18a. Nanometer-size tube-shaped molecules 7a, 7b and 8 were obtained by cyclization of tetrafunctionalized molecular ribbons with the biphenyl building block. The constitution and conformation of the molecular ribbons and belts were proven by NOE experiments and X-ray analyses.
    DOI:
    10.1002/(sici)1521-3765(19990104)5:1<345::aid-chem345>3.0.co;2-t
  • 作为产物:
    描述:
    3,3',5,5'-tetrakis(methoxycarbonyl)biphenyl锂硼氢 作用下, 以 四氢呋喃 为溶剂, 以66 %的产率得到3,3',5,5'-tetrakis(hydroxymethyl)biphenyl
    参考文献:
    名称:
    由支链低聚物构建的金属-有机框架
    摘要:
    已经研究了由低聚物或聚合物有机配体制备的金属有机框架 (MOF),分别称为 oligoMOF 和 polyMOFs。在此,描述了几种 oligoMOFs,它们是由具有树突状或星状结构的支链低聚物制备的。制备了具有四个 (4(H2bdc)-b) 或八个 (8(H2bdc)-b) 1,4-苯二羧酸 (H2bdc) 基团的支链寡聚配体,用于合成等网状型 Zn(II) 基 MOF (IRMOF)。与 IRMOF-1 或先前描述的 oligoMOF 相比,支链四聚体 (4(H2bdc)-b) 产生的 oligoIRMOF-1 具有更高的环境稳定性。为了了解配体结构的影响,还从线性四聚体 (4(H2bdc)-l) 制备了 oligoIRMOFs。对于支链八聚体 (8(H2bdc)-b),发现需要添加有机碱基才能产生结晶寡核苷酸 IRMOF。多变量 MOF (MTV-MOFs) 也可以用八聚体 (8(H2bdc)-b)
    DOI:
    10.1021/acs.inorgchem.3c03452
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文献信息

  • Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element
    申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
    公开号:US10921650B2
    公开(公告)日:2021-02-16
    The present invention relates to a liquid crystal aligning agent which contains a polymer that has a site having an isocyanate group and/or a blocked isocyanate group, a site having a photoreactive group having photoalignment, and a site having at least one functional group selected from an amino group and a hydroxyl group in each molecule. The present invention provides a liquid crystal display element which enables baking at low temperatures during the formation of a liquid crystal alignment film by a photoalignment method, the liquid crystal alignment film being able to be imparted with alignment regulating property and pretilt angle developing property.
    本发明涉及一种液晶配向剂,该液晶配向剂含有一种聚合物,该聚合物在每个分子中具有具有异氰酸酯基团和/或封端异氰酸酯基团的位点、具有光配位的光活性基团的位点以及具有至少一个选自基和羟基的官能团的位点。本发明提供了一种液晶显示元件,在通过光配位法形成液晶配位膜的过程中,可在低温下进行烘烤,该液晶配位膜能够被赋予配位调节特性和前倾角度显影特性。
  • Liquid crystal aligning agent containing crosslinking agent and polymer that has site having isocyanate group and/or blocked isocyanate group and site having photoreactivity, liquid crystal alignment film, and liquid crystal display element
    申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
    公开号:US11028323B2
    公开(公告)日:2021-06-08
    Provided is a liquid crystal display element that can be baked at a low temperature when forming a liquid crystal alignment film capable of imparting an alignment regulating property and a pretilt angle developing property via a photoalignment method. Further provided is a liquid crystal display element in which the liquid crystal pretilt angles are highly stable, and display burn-in hardly occurs even due to long usage. Further provided are a vertical liquid crystal alignment film to be used in the liquid crystal display element, and a liquid crystal aligning agent with which it is possible to provide the vertical liquid crystal alignment film. A liquid crystal aligning agent of the present invention contains: component (A), which is a polymer including (A-1) a site having an isocyanate group and/or a blocked isocyanate group and (A-2) a site having photoreactivity; component (B), which is a compound having, in a molecule, at least two functional groups of at least one type selected from the group consisting of an amino group and a hydroxyl group; and an organic solvent.
    本发明提供了一种液晶显示元件,该元件在形成液晶对准膜时可在低温下烘烤,通过光对准方法赋予对准调节特性和预倾斜角显影特性。本发明还提供了一种液晶显示元件,其液晶前倾角高度稳定,即使长时间使用也几乎不会出现显示烧损。还提供了一种用于液晶显示元件的垂直液晶对准膜,以及一种可提供垂直液晶对准膜的液晶对准剂。本发明的液晶对准剂包含:成分(A),即聚合物,包括(A-1)具有异氰酸酯基团和/或封端异氰酸酯基团的位点和(A-2)具有光活性的位点;成分(B),即化合物,在分子中具有至少两种官能团,其中至少一种官能团选自基和羟基组成的组;以及有机溶剂。
  • ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN
    申请人:FUJIFILM Corporation
    公开号:US20140242502A1
    公开(公告)日:2014-08-28
    According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group, characterized in that the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group.
  • SEMICONDUCTOR ELEMENT AND INSULATING LAYER-FORMING COMPOSITION
    申请人:FUJIFILM Corporation
    公开号:US20170005266A1
    公开(公告)日:2017-01-05
    Provided is a semiconductor element having a semiconductor layer and an insulating layer adjacent to the semiconductor layer, in which the insulating layer is formed of a crosslinked product of a polymer compound having a repeating unit (IA) represented by the following General Formula (IA) and a repeating unit (IB) represented by the following General Formula (IB). In General Formula (IA), R 1a represents a hydrogen atom, a halogen atom, or an alkyl group. L 1a and L 2a each independently represent a single bond or a linking group. X represents a crosslinkable group. m2a represents an integer of 1 to 5, and in a case where m2a is 2 or more, m2a number of X's may be the same or different from each other, m1a represents an integer of 1 to 5, and in a case where m1a is 2 or more, m1a number of (-L 2a -(X) m2a )'s may be the same or different from each other. In General Formula (IB), R 1b represents a hydrogen atom, a halogen atom, or an alkyl group. L 1b represents a single bond or a linking group, and Ar 1b represents an aromatic ring, m1b represents an integer of 1 to 5.
  • SEMICONDUCTOR DEVICE AND INSULATING LAYER-FORMING COMPOSITION
    申请人:FUJIFILM Corporation
    公开号:US20170054076A1
    公开(公告)日:2017-02-23
    Provided is a semiconductor device which includes a semiconductor layer and an insulating layer adjacent to the semiconductor layer, in which the insulating layer is formed of a crosslinked product of a polymer compound that has a repeating unit (IA) represented by the following Formula (IA) and a repeating unit (IB) represented by the following Formula (IB); and an insulating layer-forming composition which is used for forming an insulating layer of a semiconductor device and contains a polymer compound that has the following repeating units (IA) and (IB). In Formulae, R 1a and R 1b each independently represent a hydrogen atom, a halogen atom, or an alkyl group. L 1a , L 2a , and L 1b each independently represent a single bond or a linking group. X represents a crosslinkable group and Y B represents a decomposable group or a hydrogen atom. m1a and m2a each independently represent an integer of 1 to 5. The symbol “*” represents a bonding position of the repeating units.
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