The present invention provides: a temporary-bonding adhesive having excellent heat resistance, whereby a semiconductor circuit formation substrate and a support substrate can be bonded by a single type of adhesive layer, the adhesive force thereof does not change over the course of steps for manufacturing a semiconductor device or the like, and the adhesive can subsequently be easily de-bonded at room temperature under mild conditions; and a method for manufacturing a semiconductor device using the temporary-bonding adhesive.
The present invention is a temporary-bonding adhesive characterized by being a polyimide copolymer having at least an acid dianhydride residue and a diamine residue, the diamine residue including both of (A1) a polysiloxane-based diamine residue represented by a general formula (1) in which n is a natural number from 1 to 15, and (B1) a polysiloxane-based diamine residue represented by a general formula (1) in which n is a natural number from 16 to 100, the polyimide copolymer containing 40-99.99 mol% of the (A1) residue and 0.01-60 mol% of the (B1) residue.
本发明提供了:一种具有优异耐热性的临时粘接剂,可通过单一类型的粘接剂层粘接半导体电路形成基板和支撑基板,其粘接力在制造半导体器件或类似器件的步骤过程中不会发生变化,并且该粘接剂随后可在室温温和条件下轻松脱粘;以及一种使用该临时粘接剂制造半导体器件的方法。
本发明是一种临时粘接粘合剂,其特征在于它是一种聚
酰亚胺共聚物,至少具有酸性二酐残基和二胺残基,二胺残基包括(A1)由通式(1)表示的聚
硅氧烷基二胺残基中的两种,通式(1)中的n是1至15的自然数,和(B1)由通式(1)表示的聚
硅氧烷基二胺残基中的两种,通式(1)中的n是16至100的自然数,聚
酰亚胺共聚物含有40-99.99摩尔%的(A1)残基和0.01-60摩尔%的(B1)残基。