The present invention provides an additive for a photoresist composition for a resist flow process. A compound of following Formula 1 having low glass transition temperature is added to a photoresist composition containing a polymer which is not suitable for the resist flow process due to its high glass transition temperature, thus improving a flow property of the photoresist composition. As a result, the photoresist composition comprising an additive of Formula 1 can be used for the resist flow process.
1
wherein, A, B, R and R′ are as defined in the specification of the invention.
本发明提供了一种用于光阻流程的光阻组合物添加剂。将具有低
玻璃转移温度的以下式1化合物添加到包含由于其高
玻璃转移温度而不适用于阻抗流程的聚合物的光阻组合物中,从而改善光阻组合物的流动性能。因此,含有式1添加剂的光阻组合物可用于阻抗流程。其中,A、B、R和R'如本发明规范中所定义。