The present invention provides novel tertiary alcohol compounds which are useful as monomers for the preparation of photoresist materials having high transparency and a great affinity for the substrate and hence suitable for use in photolithography using a light source comprising preferably light having a wavelength of 300 nm or less and more preferably light emitted from an ArF excimer laser.
Specifically, the present invention provides tertiary alcohols compounds represented by the following general formula (1):
1
wherein R
1
and R
2
each independently represents a straight-chain, branched or cyclic alkyl group having 1 to 10 carbon atoms, in which some or all of the hydrogen atoms on the constituent carbon atoms may be replaced by a halogen atom or halogen atoms, or R
1
and R
2
may be joined together to form an aliphatic hydrocarbon ring; Z represents a straight-chain, branched or cyclic divalent organic group having 2 to 10 carbon atoms; and k is 0 or 1.
本发明提供了一种新型的
三级醇化合物,它们可用作单体,用于制备具有高透明度和对基底具有很强亲和力的光阻材料,因此适用于使用光源的光刻。该光源最好具有300纳米或更短波长的光,更好的是从ArF准分子激光发射的光。具体而言,本发明提供了由下式(1)表示的
三级醇化合物:
其中,R1和R2各自独立地表示具有1到10个碳原子的直链、支链或环烷基,其中构成碳原子上的一些或所有氢原子可以被卤素原子或卤素原子替代,或者R1和R2可以结合形成脂肪族碳氢化合物环;Z表示具有2到10个碳原子的直链、支链或环状双价有机基团;k为0或1。