5,5'-oxybis[2-trifluoromethanesulfonyloxy-1H-isoindole-1,3(2H)-dione] | 135179-36-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 5,5'-oxybis[2-trifluoromethanesulfonyloxy-1H-isoindole-1,3(2H)-dione]
• 英文别名: [5-[1,3-Dioxo-2-(trifluoromethylsulfonyloxy)isoindol-5-yl]oxy-1,3-dioxoisoindol-2-yl] trifluoromethanesulfonate
• CAS: 135179-36-1
• 化学式: C₁₈H₆F₆N₂O₁₁S₂
• 分子量: 604.375
• InChiKey: ASBQSVMKBJLWMS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.1
• 重原子数：
  39
• 可旋转键数：
  6
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.11
• 拓扑面积：
  188
• 氢给体数：
  0
• 氢受体数：
  17

文献信息

• Polymer and photoresist compositions
  申请人：Shipley Company, L.L.C.

  公开号：US20020173680A1

  公开（公告）日：2002-11-21

  Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.

  本文披露了螺环烯烃聚合物、制备螺环烯烃聚合物的方法、包括螺环烯烃树脂粘合剂的光刻胶组合物，以及利用这种光刻胶组合物形成凸版图像的方法。
• Processes for producing silane monomers and polymers and photoresist compositions comprising same
  申请人：Shipley Company, L.L.C.

  公开号：US20030219676A1

  公开（公告）日：2003-11-27

  The invention includes new Si-containing monomers, polymers containing such monomers and photoresists that contain the polymers. Synthetic methods of the invention include reacting a vinyl carbocyclic aryl ester compound with a reactive silane compound to provide the monomer.

  该发明包括新的含硅单体、含有这种单体的聚合物和含有聚合物的光刻胶。该发明的合成方法包括将乙烯基环烷基酯化合物与反应性硅烷化合物反应以提供单体。
• Process for producing polysiloxanes and photoresist compositions comprising the same
  申请人：Shipley Co. L.L.C.

  公开号：EP1455228A1

  公开（公告）日：2004-09-08

  New methods are provided for synthesis of polysiloxanes (silsesquioxanes) and photoresists comprising same. Synthetic methods of the invention include use of a polymerization templating reagent that has multiple reactive nitrogen groups, particularly a diamine reagent.

  本发明提供了合成聚硅氧烷（silsesquioxanes）和包含聚硅氧烷的光致抗蚀剂的新方法。本发明的合成方法包括使用具有多个活性氮基团的聚合模板试剂，特别是二胺试剂。
• Reactive photo acid-generating agent and heat-resistant photoresist composition with polyamide precursor
  申请人：Korea Research Institute of Chemical Technology

  公开号：US20030064315A1

  公开（公告）日：2003-04-03

  The present invention relates to a reactive photo acid-generating agent and a heat-resistant photoresist composition comprising the same. In particularly, the present invention relates to the heat-resistant photoresist composition comprising the photo acid-generating agent expressed by the following formula (1), which can increase the degree of polymerization, and polyamide oligomers having acetal or its cyclized derivatives, which have an ability of that light-exposed area is dissolved in the developer and light-unexposed area is convertible to a heat-resistant polymer in the latter heating process and thus, it can be used for passivation layer, buffer coat or layer-insulating film of the multilayer printed circuit board, 1 wherein 2 and R are the same as defined in the detailed description of the Invention.

  本发明涉及一种活性光酸生成剂和由其组成的耐热光刻胶组合物。特别是，本发明涉及一种耐热光刻胶组合物，该组合物包含由下式（1）表示的光酸生成剂（可提高聚合度）和具有缩醛或其环化衍生物的聚酰胺低聚物，后者具有使受光区域溶解在显影剂中和使未受光区域在后一加热过程中转化为耐热聚合物的能力，因此可用于多层印刷电路板的钝化层、缓冲涂层或层绝缘膜、 1 其中 2 和 R 与本发明详细说明中所定义的相同。
• Processes for producing polysiloxanes and photoresist compositions comprising same
  申请人：Shipley Company, L.L.C.

  公开号：US20030224286A1

  公开（公告）日：2003-12-04

  New methods are provided for synthesis of polysiloxanes (silsesquioxanes) and photoresists comprising same. Synthetic methods of the invention include use of a polymerization templating reagent that has multiple reactive nitrogen groups, particularly a diamine reagent.

  本发明提供了合成聚硅氧烷（silsesquioxanes）和包含聚硅氧烷的光致抗蚀剂的新方法。本发明的合成方法包括使用具有多个活性氮基团的聚合模板试剂，特别是二胺试剂。