2-bromo-nonanal | 53634-76-7

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-bromo-nonanal
• 英文别名: 2-bromodecanal；2-Bromononanal
• CAS: 53634-76-7
• 化学式: C₉H₁₇BrO
• 分子量: 221.137
• InChiKey: FFCXDPNAZWNARC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4
• 重原子数：
  11
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  2-bromo-nonanal 在 苯甲酰氯 作用下， 以 乙醇 为溶剂， 生成 1-methyl-5-n-heptylimidazole
  参考文献：
  名称：

  Carpene; Collon; Remaury, Journal of Pharmacology and Experimental Therapeutics, 1995, vol. 272, # 2, p. 681 - 688

  摘要：

  DOI：
• 作为产物：
  描述：

  1c-methylsulfanyl-non-1-ene 在 N-溴代丁二酰亚胺(NBS) 、 水 作用下， 以 乙腈 为溶剂， 生成 2-bromo-nonanal
  参考文献：
  名称：

  Geiss,K.-H. et al., Angewandte Chemie, 1974, vol. 86, # 13, p. 484 - 486

  摘要：

  DOI：

文献信息

• [EN] INHIBITORS OF SPHINGOSINE KINASE 1<br/>[FR] INHIBITEURS DE LA SPHINGOSINE KINASE 1
  申请人：GENZYME CORP

  公开号：WO2010033701A3

  公开（公告）日：2016-03-24
• Discovery of novel sphingosine kinase-1 inhibitors. Part 2
  作者：Yibin Xiang、Bradford Hirth、John L. Kane、Junkai Liao、Kevin D. Noson、Christopher Yee、Gary Asmussen、Maria Fitzgerald、Christine Klaus、Michael Booker

  DOI：10.1016/j.bmcl.2010.06.019

  日期：2010.8

  Building on our initial work, we have identified additional novel inhibitors of sphingosine kinase-1 (SK1). These new analogs address the shortcomings found in our previously reported compounds. Inhibitors 51 and 54 demonstrated oral bioavailability in a rat PK study. Published by Elsevier Ltd.
• 10.1080/bbb.59.401
  作者：Iriye、Nakamura、Takeshita

  DOI：10.1080/bbb.59.401

  日期：——
• Doelling,K. et al., Journal fur praktische Chemie (Leipzig 1954), 1979, vol. 321, # 4, p. 643 - 654
  作者：Doelling,K. et al.

  DOI：——

  日期：——
• NPN-type low molecular aromatic ring compounds and organic semiconductors and electronic devices incorporating such compounds
  申请人：Jeong Eun Jeong

  公开号：US20070166871A1

  公开（公告）日：2007-07-19

  Disclosed herein are NPN-type low molecular aromatic ring compounds, organic semiconductor layers formed from such compounds that exhibit improved electrical stability and methods of forming such layers using solution-based processes, for example, spin coating processes performed at or near room temperature. These NPN-type compounds may be used, either singly or in combination, for fabricating organic semiconductor layers in electronic devices. The NPN-type aromatic ring compounds according to example embodiments may be deposited as a solution on a range of substrates to form a coating film that is then subjected to a thermal treatment to form a semiconductor thin film across large substrate surfaces that exhibits reduced leakage currents relative to conventional PNP-type organic semiconductor materials, thus improving the electrical properties of the resulting devices.