1-(2-oxo-2-p-tolyl-ethyl)-tetrahydro-thiophenium 4-cyanobenzenesulfonate | 1172614-55-9

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-(2-oxo-2-p-tolyl-ethyl)-tetrahydro-thiophenium 4-cyanobenzenesulfonate
• 英文别名: 4-Cyanobenzenesulfonate;1-(4-methylphenyl)-2-(thiolan-1-ium-1-yl)ethanone
• CAS: 1172614-55-9
• 化学式: C₇H₄NO₃S*C₁₃H₁₇OS
• 分子量: 403.523
• InChiKey: GJXXCJNLIMEQQO-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  3.05
• 重原子数：
  27
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.3
• 拓扑面积：
  107
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• AROMATIC FLUORINE-FREE PHOTOACID GENERATORS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME
  申请人：Li Wenjie

  公开号：US20090181319A1

  公开（公告）日：2009-07-16

  Fluorine-free photoacid generators and photoresist compositions containing fluorine-free photoacid generators are enabled as alternatives to PFOS/PFAS photoacid generator-containing photoresists. The photoacid generators are characterized by the presence of a fluorine-free aromatic sulfonate anionic component having one or more electron withdrawing groups. The photoacid generators preferably contain a fluorine-free onium cationic component, more preferably a sulfonium cationic component. The photoresist compositions preferably contain an acid sensitive imaging polymer having a lactone functionality. The compositions are especially useful for forming material patterns using 193 nm (ArF) imaging radiation.

  无氟光酸发生剂和含有无氟光酸发生剂的光阻组合物作为PFOS / PFAS光酸发生剂光阻的替代品。这些光酸发生剂的特点在于具有一个或多个电子提取基团的无氟芳香磺酸盐阴离子成分。这些光酸发生剂最好包含无氟的离子阳离子成分，更好的是磺酸盐阳离子成分。这些光阻组合物最好含有具有内酯官能团的酸敏感成像聚合物。这些组合物在使用193 nm（ArF）成像辐射时特别有用于形成材料图案。
• [EN] AROMATIC FLUORINE-FREE PHOTOACID GENERATORS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME<br/>[FR] GÉNÉRATEURS DE PHOTOACIDE EXEMPTS DE FLUOR AROMATIQUE ET COMPOSITIONS DE RÉSINE PHOTOSENSIBLE LES CONTENANT
  申请人：IBM

  公开号：WO2009091704A2

  公开（公告）日：2009-07-23

  Fluorine-free photoacid generators and photoresist compositions containing fluorine-free photoacid generators are enabled as alternatives to PFOS/PFAS photoacid generator-containing photoresists. The photoacid generators are characterized by the presence of a fluorine-free aromatic sulfonate anionic component having one or more electron withdrawing groups. The photoacid generators preferably contain a fluorine-free onium cationic component, more preferably a sulfonium cationic component. The photoresist compositions preferably contain an acid sensitive imaging polymer having a lactone functionality. The compositions are especially useful for forming material patterns using 193nm (ArF) imaging radiation.