PERYLENE TETRACARBOXYLIC ACID BISIMIDE DERIVATIVE, N-TYPE SEMICONDUCTOR, A METHOD FOR PRODUCING N-TYPE SEMICONDUCTOR, AND ELECTRONIC DEVICE
申请人:Funahashi Masahiro
公开号:US20140024171A1
公开(公告)日:2014-01-23
The present invention provides a perylene tetracarboxylic acid bisimide derivative which enables the formation of an n-type semiconductor having high carrier mobility and has superior solubility. The perylene tetracarboxylic acid bisimide derivative is a perylene tetracarboxylic acid bisimide derivative represented by the following chemical formula (I), a tautomer or stereoisomer of the perylene tetracarboxylic acid bisimide derivative, or a salt of the perylene tetracarboxylic acid bisimide derivative or the tautomer or stereoisomer,
In the chemical formula (I), R
1
to R
6
each represents a hydrogen atom, organooligosiloxane, or any substituent, at least one of R
1
to R
6
represents a monovalent substituent derived from organooligosiloxane, L
1
and L
2
each represents a single bond or a linking group, R
7
to R
10
each represents a lower alkyl group or a halogen, and o, p, q, and r each represents an integer from 0 to 2.
本发明提供了一种苝酞菁四羧酸双亚胺衍生物,其能够形成具有高载流子迁移率的n型半导体,并具有优异的溶解性。该苝酞菁四羧酸双亚胺衍生物是由以下化学式(I)所表示的苝酞菁四羧酸双亚胺衍生物,其互变异构体或立体异构体,或者是该苝酞菁四羧酸双亚胺衍生物或其互变异构体或立体异构体的盐。在化学式(I)中,R1至R6分别表示氢原子、有机寡硅氧烷或任何取代基,其中至少一个R1至R6表示来自有机寡硅氧烷的一价取代基,L1和L2分别表示单键或连接基,R7至R10分别表示低碳烷基或卤素,o、p、q和r分别表示0至2的整数。