RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORMING RESIST PATTERN
申请人:Tokyo Ohka Kogyo Co., Ltd.
公开号:US20140356787A1
公开(公告)日:2014-12-04
A resist composition comprising a compound (m0) (wherein Rb
1
represents an electron withdrawing group; Rb
2
and Rb
3
each independently represents an aryl group, an alkyl group or an alkenyl group, provided that Rb
2
and Rb
3
may be mutually bonded to form a ring with the sulfur atom; and X0
−
represents a monovalent counteranion).