A polymeric compound having a repeated unit corresponding to an unsaturated carboxylic acid hemiacetal ester represented by the following formula (1);
wherein R
a
is a hydrogen atom, a halogen atom, an alkyl group of carbon number 1 to 6 or a haloalkyl group of carbon number 1 to 6, R
b
is a hydrocarbon group having a hydrogen atom at a first poison, R
c
is a hydrogen atom or a hydrocarbon group and R
d
is an organic group having a cyclic skeleton. This polymeric compound, further, may have a repeated unit corresponding to at least one monomer selected from a monomer having a lactone skeleton, a monomer having a cyclic ketone skeleton, a monomer having an acid anhydride group and a monomer having an imide group [except for a repeated unit corresponding to the said unsaturated carboxylic acid hemiacetal ester] and/or a repeated unit corresponding to at least one monomer selected from a monomer having a hydroxyl group and others. This polymeric compound shows superior acid-eliminating function in case of using as photoresist.
一种聚合物化合物,其重复单元对应于由以下式(1)表示的不饱和
羧酸半缩醛酯:
其中,R为氢原子,卤素原子,碳数为1到6的烷基或碳数为1到6的卤代烷基,Rb为在第一位置具有氢原子的碳氢基,Rc为氢原子或碳氢基,而Rd为具有环状骨架的有机基团。此聚合物化合物还可以具有对应于至少一种单体的重复单元,所述单体具有内酯骨架、环状酮骨架、酸酐基或亚酰胺基[除了对应于所述不饱和
羧酸半缩醛酯的重复单元]和/或对应于至少一种具有羟基的单体的重复单元和其他单体。该聚合物化合物在用作光刻胶时表现出优越的酸消除功能。