Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, carboxylic acid salt and carboxylic acid
申请人:JSR CORPORATION
公开号:US11320735B2
公开(公告)日:2022-05-03
A radiation-sensitive resin composition contains: a polymer having an acid-labile group, a radiation-sensitive acid generator, a compound represented by the following formula (1), and a solvent. In the formula (1), X represents an oxygen atom or a sulfur atom; R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; R2 to R5 each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and optionally two or more of R2 to R5 taken together represent an alicyclic structure having 3 to 20 ring atoms or an aliphatic heterocyclic structure having 3 to 20 ring atoms together with the carbon atom to which the two or more of R2 to R5 bond; Zn+ represents a cation having a valency of n; and n is an integer of 1 to 3.
一种辐射敏感树脂组合物包含:具有酸标签基团的聚合物、辐射敏感酸发生器、由下式(1)表示的化合物和溶剂。式(1)中,X 代表氧原子或硫原子;R1 代表氢原子或具有 1 至 20 个碳原子的一价有机基团;R2 至 R5 各自独立地代表氢原子或具有 1 至 20 个碳原子的一价有机基团,可选地,两个或两个以上的 R2 至 R5 合在一起代表具有 3 至 20 个环原子的脂环族结构或具有 3 至 20 个环原子的脂族杂环族结构,连同两个或两个以上的 R2 至 R5 所键合的碳原子;Zn+ 代表价数为 n 的阳离子;n 为 1 至 3 的整数。