A method of pattern formation. The method is capable of inhibiting a post-development residue from remaining on a support equipped with an electrode, and a method of producing a polysilane-polysiloxane resin precursor that is suitable for use in the method of pattern formation. The method of pattern formation includes forming a film of a silicon-containing composition on the support equipped with an electrode forming a film of a resin composition on the film of a silicon-containing composition, and forming the film of a resin composition into a pattern.
一种图案形成方法。该方法能够抑制显影后残留物残留在装有电极的支架上,以及生产适合用于图案形成方法的聚
硅烷-聚
硅氧烷树脂前体的方法。图案形成方法包括在装有电极的支架上形成一层含
硅组合物薄膜,在含
硅组合物薄膜上形成一层
树脂组合物薄膜,以及将
树脂组合物薄膜形成图案。