New alkanesulfonanilide derivatives, processes for preparation thereof and pharmaceutical composition comprising the same
申请人:FUJISAWA PHARMACEUTICAL CO., LTD.
公开号:EP0273369A2
公开(公告)日:1988-07-06
Alkanesulfonanilide derivatives of the formula:
wherein
R¹, R² and R⁸ are each hydrogen or certain substituents
R³ is lower alkyl, or mono or di-lower alkylamino,
R⁴ is acyl, cyano, carboxy, hydroxy(lower)alkyl, mercapto, lower alkylthio, lower alkylsulfinyl, lower alkylsulfonyl, 5-membered unsaturated heterocyclic group which may have amino, lower alkanoylamino, lower alkylthio or lower alkylsulfonyl, phenylthio which may have nitro or amino, lower alkanoyl(lower)alkenyl or a group of the formula :
wherein
R⁶ is hydrogen, amino or lower alkyl and
R⁷ is hydroxy, lower alkoxy, carboxy(lower)alkoxy, lower alkoxycarbonyl(lower)alkoxy, ureido or thioureido, and
R⁵ is hydrogen, halogen, lower alkyl or lower alkanoyl, and pharmaceutically acceptable salts thereof, processes for their preparation and pharmaceutical compositions comprising them as an active ingredient.
式中的烷磺酰苯胺衍生物:
其中
R¹、R² 和 R⁸ 均为氢或某些取代基
R³ 是低级烷基,或单或双低级烷基氨基、
R⁴是酰基、氰基、羧基、羟基(低级)烷基、巯基、低级烷硫基、低级烷基亚磺酰基、低级烷基磺酰基、可能具有氨基的五元不饱和杂环基团、低级烷酰基氨基、低级烷硫基或低级烷基磺酰基、可能具有硝基或氨基的苯硫基、低级烷酰基(低级)烯基或式中的基团:
其中
R⁶ 是氢、氨基或低级烷基,以及
R⁷ 是羟基、低级烷氧基、羧基(低级)烷氧基、低级烷氧羰基(低级)烷氧基、脲基或硫脲基,以及
R⁵ 是氢、卤素、低级烷基或低级烷酰基,以及它们的药学上可接受的盐、它们的制备工艺和包含它们作为活性成分的药物组合物。