cyclooctyl ethyl ether | 95387-25-0

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: cyclooctyl ethyl ether
• 英文别名: ethyl-cyclooctyl ether；Aethyl-cyclooctyl-aether；Ethoxycyclooctane
• CAS: 95387-25-0
• 化学式: C₁₀H₂₀O
• 分子量: 156.268
• InChiKey: BTROOOSSNBYPGW-UHFFFAOYSA-N

物化性质

• 沸点：
  85-86 °C(Press: 16 Torr)
• 密度：
  0.888 g/cm3(Temp: 25 °C)

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  11
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  环辛醇 在 sodium hydride 、 苯 作用下， 生成 cyclooctyl ethyl ether
  参考文献：
  名称：

  Cyclic Polyolefins. XXX. Reactions of Cycloöctatrienone; Ethoxycycloöctatetraene

  摘要：

  DOI：

  10.1021/ja01633a048

文献信息

• 2-W-diaminocarboxylic acid compounds
  申请人：Rentzea Costin

  公开号：US20050085516A1

  公开（公告）日：2005-04-21

  2,ω-Diaminocarboxylic acid compounds of formula (I), where X, X 1 , Ar ω , Ar 2 and Y are as defined in claim 1, and their use as herbicides, are described.

  公式（I）中的2,ω-二氨基羧酸化合物，其中X，X1，Arω，Ar2和Y如权利要求1所定义，并描述了它们作为除草剂的用途。
• HEMIACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20160238930A1

  公开（公告）日：2016-08-18

  A polymer for resist use is obtainable from a hemiacetal compound having formula (1 a ) wherein R 1 is H, CH 3 or CF 3 , R 2 to R 4 each are H or a monovalent hydrocarbon group, X 1 is a divalent hydrocarbon group, ZZ designates a non-aromatic mono- or polycyclic ring of 4 to 20 carbon atoms having a hemiacetal structure, k 1 =0 or 1, and k 2 =0 to 3. A resist composition comprising the polymer displays controlled acid diffusion and low roughness during both positive and negative tone developments.

  从具有以下式（1a）的半缩醛化合物获得用于抗蚀的聚合物，其中R1为H、CH3或CF3，R2至R4分别为H或单价碳氢基团，X1为二价碳氢基团，ZZ表示具有半缩醛结构的非芳香性4至20个碳原子的单环或多环环，k1=0或1，k2=0至3。包含该聚合物的抗蚀组合物显示出在正片和负片显影过程中控制酸扩散和低粗糙度。
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20150323865A1

  公开（公告）日：2015-11-12

  A polymer for resist use is obtainable from a monomer having formula (1) wherein R 1 is H, CH 3 or CF 3 , R 2 and R 3 each are H or a monovalent hydrocarbon group, X 1 is a divalent hydrocarbon group, k 1 =0 or 1, and Z forms a 5 or 6-membered alicyclic ring. A resist composition comprising the polymer is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness during both alkaline development and organic solvent development.

  可以从具有式（1）的单体获得用于抗蚀的聚合物，其中R1为H、CH3或CF3，R2和R3各自为H或一价碳氢基团，X1为二价碳氢基团，k1=0或1，Z形成5或6元脂环。包含该聚合物的抗蚀组合物具有货架稳定性，显示高溶解对比度，控制酸扩散和低粗糙度，在碱性显影和有机溶剂显影过程中表现出色。
• Addition of Alcohol to Olefinic Bonds by Paired Electrosynthesis with Raney-Nickel Cathode
  作者：Tsukasa Yamada、Tetsuo Osa、Tomokazu Matsue

  DOI：10.1246/cl.1987.995

  日期：1987.5.5

  A one-pot addition reaction of an alcohol to an olefinic double bond was successfully performed by use of paired electrosynthesis with a Raney-nickel cathode.

  通过使用配对电合成和雷尼镍阴极，成功地进行了醇与烯烃双键的一锅加成反应。
• POLYMERIZABLE ESTER COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：HASEGAWA Koji

  公开号：US20130017484A1

  公开（公告）日：2013-01-17

  Polymerizable ester compounds having formula (1) are novel wherein R 1 is H, F, methyl or trifluoromethyl, R 2 is an acid labile group, Aa is a divalent hydrocarbon group which may be separated by —O— or —C(═O)—, and k 1 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent developed properties.

  具有式（1）的可聚合酯化合物是新颖的，其中R1为H、F、甲基或三氟甲基，R2为酸敏感基团，Aa为二价的碳氢基团，可以通过—O—或—C（═O）—分离，k1为0或1。它们可用作单体，用于生产对辐射≦500 nm透明的聚合物。以这些聚合物作为基础树脂的辐射敏感抗蚀剂组合物表现出优异的显影性能。