(2S,4R,5S)-Muscarine | 7619-12-7

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: (2S,4R,5S)-Muscarine
• 英文别名: (4-hydroxy-5-methyloxolan-2-yl)methyl-trimethylazanium
• CAS: 7619-12-7；300-54-9
• 化学式: C9H20NO2+
• 分子量: 174.26
• InChiKey: UQOFGTXDASPNLL-UHFFFAOYSA-N

物化性质

• 沸点：
  305.25°C (rough estimate)
• 密度：
  1.0117 (rough estimate)
• 溶解度：
  Water (Easy)

计算性质

• 辛醇/水分配系数(LogP)：
  0.1
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  29.5
• 氢给体数：
  1
• 氢受体数：
  2

ADMET

毒理性

• 毒性总结

毒蕈碱是一种竞争性抑制剂。它在乙酰胆碱受体上模仿神经递质乙酰胆oline的作用。

Muscarine is a competitive inhibitor. It mimics the action of the neurotransmitter acetylcholine at acetylcholine receptors. (L1011)

来源:Toxin and Toxin Target Database (T3DB)

毒理性

• 致癌物分类

对人类无致癌性（未列入国际癌症研究机构IARC清单）。

No indication of carcinogenicity to humans (not listed by IARC).

来源:Toxin and Toxin Target Database (T3DB)

毒理性

• 健康影响

中毒通常在2小时内消退。死亡情况罕见，但在严重情况下可能导致心搏或呼吸衰竭。

Intoxication generally subsides within 2 hours. Death is rare, but may result from cardiac or respiratory failure in severe cases. (L1011)

来源:Toxin and Toxin Target Database (T3DB)

毒理性

• 暴露途径

口服、皮肤、吸入和 parenteral（被污染的药物）。 (A3101)

Oral, dermal, inhalation, and parenteral (contaminated drugs). (A3101)

来源:Toxin and Toxin Target Database (T3DB)

毒理性

• 症状

鹅膏碱中毒的特点是摄入蘑菇后15至30分钟内唾液分泌增加、出汗（排汗）和流泪（泪液分泌）。在服用大剂量时，这些症状可能会继发腹痛、严重恶心、腹泻、视力模糊和呼吸困难。

Muscarine poisoning is characterized by increased salivation, sweating (perspiration), and tearflow (lacrimation) within 15 to 30 minutes after ingestion of the mushroom. With large doses, these symptoms may be followed by abdominal pain, severe nausea, diarrhea, blurred vision, and labored breathing. (L1011)

来源:Toxin and Toxin Target Database (T3DB)

制备方法与用途

类别：有毒物质

毒性分级：剧毒

急性毒性：静脉-小鼠 LD50: 0.23 毫克/公斤

可燃性危险特性：可燃；火场分解产生有毒氮氧化物气体

储运特性：库房低温、通风、干燥；与食品原料分开存放

灭火剂：水、二氧化碳、干粉、砂土

文献信息

• PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20160041465A1

  公开（公告）日：2016-02-11

  The pattern forming method includes (1) forming a film using an active light sensitive or radiation sensitive resin composition, (2) exposing the film to active light or radiation, and (3) developing the exposed film using a developer including an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) having a group which generates a polar group by being decomposed due to the action of an acid, the resin (A) has a phenolic hydroxyl group and/or a phenolic hydroxyl group protected with a group leaving due to the action of an acid, and the developer including the organic solvent contains an additive which forms at least one interaction of an ionic bond, a hydrogen bond, a chemical bond, and a dipole interaction, with the polar group.
• RESIST PATTERN-FORMING METHOD
  申请人：JSR CORPORATION

  公开号：US20170075224A1

  公开（公告）日：2017-03-16

  A resist pattern-forming method comprises applying a chemically amplified resist material on a substrate to form a resist film on the substrate. The resist film is patternwise exposed to a radioactive ray having a wavelength of no greater than 250 nm. The resist film patternwise exposed is floodwise exposed to a radioactive ray having a wavelength of greater than 250 nm. The resist film floodwise exposed is baked and developed with a developer solution comprising an organic solvent. The chemically amplified resist material comprises a component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The component comprises: a radiation-sensitive sensitizer generating agent, and at least one of a radiation-sensitive acid-and-sensitizer generating agent and a radiation-sensitive acid generating agent. The radiation-sensitive sensitizer generating agent comprises a compound represented by formula (B).
• US9651863B2
  申请人：——

  公开号：US9651863B2

  公开（公告）日：2017-05-16
• US9939729B2
  申请人：——

  公开号：US9939729B2

  公开（公告）日：2018-04-10