9-hydroxy-9-(phenanthryl-(9))-fluorene | 5467-23-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 菲及其衍生物
• 英文名称: 9-hydroxy-9-(phenanthryl-(9))-fluorene
• 英文别名: 9-Hydroxy-9-(phenanthryl-(9))-fluoren；9--fluoren-9-ol；9-(Phenanthren-9-yl)-9h-fluoren-9-ol；9-phenanthren-9-ylfluoren-9-ol
• CAS: 5467-23-2
• 化学式: C₂₇H₁₈O
• 分子量: 358.439
• InChiKey: STMBLSPAFKRMST-UHFFFAOYSA-N

物化性质

• 熔点：
  193-194 °C(Solv: benzene (71-43-2); ligroine (8032-32-4))
• 沸点：
  600.4±24.0 °C(Predicted)
• 密度：
  1.297±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  6.4
• 重原子数：
  28
• 可旋转键数：
  1
• 环数：
  6.0
• sp3杂化的碳原子比例：
  0.04
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

安全信息

• 海关编码：
  2906299090

反应信息

• 作为反应物：
  描述：

  9-hydroxy-9-(phenanthryl-(9))-fluorene 在 乙酰氯 作用下， 生成 9-(9-chloro-fluoren-9-yl)-phenanthrene
  参考文献：
  名称：

  368. 9-芳基-9-氯芴和相关化合物在乙醇-丙酮，乙醇或甲醇中的溶剂分解动力学

  摘要：

  DOI：

  10.1039/jr9640001895
• 作为产物：
  描述：

  9-芴酮 、 9-溴菲 在 正丁基锂 作用下， 以 四氢呋喃 为溶剂， 反应 19.5h， 以67%的产率得到9-hydroxy-9-(phenanthryl-(9))-fluorene
  参考文献：
  名称：

  化合物、有机电致发光材料和有机电致发光器件

  摘要：

  本发明涉及以下有机化合物，由如下通式(I)表示：R1～R8分别独立地选自氢、氰基、取代或未取代的C1～C20的脂肪烃基、取代或未取代的C6～C30的芳基；L1、L2为分别独立选自单键、C6～C30的亚芳基、C3～C30的亚杂芳基；Ar1为取代或未取代的C6～C60的芳基、取代或未取代的C3～C60的亚杂芳基，L3选自单键、取代或未取代的C6～C30的亚芳基、取代或未取代的C3～C30的亚杂芳基，Ar3为取代或未取代的C3～C30的亚杂芳基，其中，L3或Ar3之中，至少存在一个吡啶基或者亚吡啶基，L4为选自单键、取代或未取代的C6～C30的亚芳基，Ar2为取代或未取代的C6～C30的芳基。

  公开号：

  CN110498765B

文献信息

• PHENANTHRENE DERIVATIVES. VIII. HEXAARYLETHANES CONTAINING THE PHENANTHRENE NUCLEUS^*
  作者：W. E. BACHMANN、M. C. KLOETZEL

  DOI：10.1021/jo01227a009

  日期：1937.9
• Michailow; Tschernowa, Zhurnal Obshchei Khimii, 1951, vol. 21, p. 1517,1523; engl. Ausg. S. 1659, 1664
  作者：Michailow、Tschernowa

  DOI：——

  日期：——
• Syntheses of Phenanthrene Derivatives. I. Reactions of 9-Phenanthrylmagnesium Bromide
  作者：W. E. Bachmann

  DOI：10.1021/ja01321a039

  日期：1934.6
• COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20210011384A1

  公开（公告）日：2021-01-14

  A composition for forming an organic film contains a polymer having a partial structure shown by the following general formula (1A) as a repeating unit, and an organic solvent, where AR1 and AR2 each represent a benzene ring or a naphthalene ring which optionally have a substituent; each R represents a hydrogen atom or a monovalent organic group having 2 to 10 carbon atoms and an unsaturated bond; R′ represents a single bond or W1; and W1 represents a divalent organic group having 6 to 80 carbon atoms and one or more aromatic rings. This invention provides: a composition for forming an organic film, the composition containing a polymer having an indenofluorene structure with high carbon content and thermosetting property as to enable high etching resistance and excellent twisting resistance; a patterning process using this composition; and a polymer for providing such a composition for forming an organic film.
• COATING-TYPE COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, POLYMER, AND METHOD FOR MANUFACTURING POLYMER
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20210278766A1

  公开（公告）日：2021-09-09

  The present invention provides a. coating-type composition for forming an. organic film containing: a polymer having a structure shown by the following general formula (1) as a partial structure; and an organic solvent, where in the formula (1), ring structures Ar1 and Ar2 represent a benzene rive or a naphthalene ring optionally having a substituent, and W 1 represents an aryl croup having 6 to 30 carbon atoms and optionally having a substituent. This provides a coating-type composition for forming an organic film that can. form an organic film having high pattern-curving resistance and high dry-etching resistance, the composition being excellent in solvent solubility and having a low generation of defects.