propionic acid-(1-methoxy-ethyl ester) | 70767-94-1

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: propionic acid-(1-methoxy-ethyl ester)
• 英文别名: Propionsaeure-(1-methoxy-aethylester)；propanoic acid 1-methoxy-ethyl ester；1-Methoxyethyl propanoate
• CAS: 70767-94-1
• 化学式: C₆H₁₂O₃
• 分子量: 132.159
• InChiKey: BDQPVBVYLQZZAM-UHFFFAOYSA-N

物化性质

• 沸点：
  41-43 °C(Press: 18 Torr)
• 密度：
  0.9573 g/cm3

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  9
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  1-氯-1-甲氧基乙烷 、 sodium proprionate 生成 propionic acid-(1-methoxy-ethyl ester)
  参考文献：
  名称：

  Hurd; Green, Journal of the American Chemical Society, 1941, vol. 63, p. 2202

  摘要：

  DOI：

文献信息

• PHOTO-DESTROYABLE QUENCHER AND ASSOCIATED PHOTORESIST COMPOSITION, AND DEVICE-FORMING METHOD
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20150346599A1

  公开（公告）日：2015-12-03

  A photo-destroyable quencher has the structure wherein X, n, and R 1 -R 6 are defined herein, and at least one of R 2 , R 3 , R 4 , R 5 , and R 6 is halogen, nitro, C 1-12 fluorinated alkyl, cyano, aldehyde, C 2-20 ester, C 2-20 ketone, C 1-20 sulfoxyl hydrocarbyl, C 1-20 sulfonyl hydrocarbyl, or sulfonamide. The photo-destroyable quencher exhibits improved solution stability and reduced hygroscopic properties relative to triphenylsulfonium phenolate. A photoresist composition including an acid-sensitive polymer, a photoacid generator, and the photo-destroyable quencher exhibits increased contrast and/or critical dimension uniformity relative to corresponding photoresist compositions comparative photo-destroyable quenchers.

  一种可被光破坏的猝灭剂具有以下结构，其中X、n和R1-R6如本文所定义，且R2、R3、R4、R5和R6中至少有一个是卤素、硝基、C1-12氟化烷基、氰基、醛基、C2-20酯、C2-20酮、C1-20烷基磺氧基、C1-20烷基磺酰基或磺胺基。该可被光破坏的猝灭剂相对于三苯基砜酚酚酚酚具有改善的溶液稳定性和减少的亲湿性能。包括酸敏感聚合物、光酸发生剂和可被光破坏的猝灭剂的光刻胶组合物相对于相应的光刻胶组合物比较照片破坏性猝灭剂具有增加的对比度和/或临界尺寸均匀性。
• PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20150064620A1

  公开（公告）日：2015-03-05

  A photoacid generator compound has formula (1) wherein n is zero or 1; and R 1 -R 6 are each independently hydrogen, halogen, or unsubstituted or substituted C 1-20 linear or branched alkyl, C 1-20 cycloalkyl, C 6-20 aryl, C 3-20 heteroaryl, or an acid-generating group having the structure *L-Z − M + ] wherein L is an unsubstituted or substituted C 1-50 divalent group; Z − is a monovalent anionic group; and M + is an iodonium or sulfonium cation. Geminal R groups can combine to form a ring with the carbon to which they are attached, as long as no more than two such rings are formed. At least one of R 1 -R 6 includes the acid-generating group or two germinal R groups combine to form the acid-generating group. Also described are a photoresist composition incorporating the photoacid generator compound, a coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using a layer of the photoresist composition.

  一种光酸发生剂化合物的化学式为（1），其中n为零或1；R1-R6各自独立地为氢、卤素、未取代或取代的C1-20线性或支链烷基、C1-20环烷基、C6-20芳基、C3-20杂环芳基或具有结构*L-Z−M+的产生酸的基团，其中L为未取代或取代的C1-50二价基团；Z−为单价阴离子基团；M+为碘离子或硫离子阳离子。同位素R基团可以结合形成与它们附着的碳原子的环，只要不形成超过两个这样的环即可。R1-R6中至少有一个包括产生酸的基团，或两个同位素R基团结合形成产生酸的基团。还描述了包含光酸发生剂化合物的光刻胶组合物、包括光刻胶组合物层的涂覆基板以及使用光刻胶组合物层形成电子器件的方法。
• POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONALITY AND BASE-SOLUBILITY-ENHANCING FUNCTIONALITY, AND ASSOCIATED PHOTORESIST COMPOSITION AND ELECTRONIC DEVICE FORMING METHOD
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20160102158A1

  公开（公告）日：2016-04-14

  A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. Each of the photoacid-generating repeat units comprises an anion and a photoacid-generating cation that collectively have structure (I) wherein q, r, R 1 , m, X, and Z − are defined herein. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

  一种聚合物包括重复单元，其中大部分是光酸生成重复单元。每个光酸生成重复单元包括光酸生成功能和增强碱溶性功能。每个光酸生成重复单元包括阴离子和光酸生成阳离子，共同具有结构（I），其中q、r、R1、m、X和Z-在此定义。该聚合物可用作光刻胶组分的一部分，该光刻胶组分还包括第二种聚合物，在酸的作用下在碱性显影剂中表现出溶解度的变化。
• PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRONIC DEVICE
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20160103391A1

  公开（公告）日：2016-04-14

  A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.

  一种光阻组合物包括第一聚合物，其中至少一半的重复单元是光酸生成重复单元，并且第二聚合物在酸的作用下在碱性显影剂中表现出溶解度的变化。在第一聚合物中，每个光酸生成重复单元包括光酸生成性能和碱性溶解度增强性能。
• Pihlaja, Kalevi; Lampi, Aija, Acta chemica Scandinavica. Series B: Organic chemistry and biochemistry, 1986, vol. 40, # 3, p. 196 - 199
  作者：Pihlaja, Kalevi、Lampi, Aija

  DOI：——

  日期：——