dipropylene glycol methyl ether acetate | 1992904-38-7

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: dipropylene glycol methyl ether acetate
• 英文别名: dipropylene glycol monomethyl ether acetate；2-(2-methoxypropoxy)propyl acetate
• CAS: 1992904-38-7
• 化学式: C₉H₁₈O₄
• 分子量: 190.24
• InChiKey: DRLRGHZJOQGQEC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  13
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  44.8
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  2-(2-甲氧基丙氧基)丙醇 、 溶剂黄146 在 1-methyl-3-butylimidazole hydrogen sulfate 作用下， 以 环己烷 为溶剂， 反应 4.0h， 以98.4%的产率得到dipropylene glycol methyl ether acetate
  参考文献：
  名称：

  一种酸性离子液体催化合成二丙二醇甲醚醋 酸酯的方法

  摘要：

  本发明公开了一种酸性离子液体催化合成二丙二醇甲醚醋酸酯的方法，其特征在于：以二丙二醇甲醚与醋酸为原料，在酸性离子液体催化剂1‑丁基‑3‑甲基咪唑硫酸氢盐和环己烷脱水剂共同作用下，采用酯化脱水法合成二丙二醇甲醚醋酸酯，其中，催化剂用量为二丙二醇甲醚与醋酸质量的0.2‑8％；二丙二醇甲醚与醋酸的摩尔比为1∶1‑3；酯化反应温度80‑160℃，酯化反应中生成的水与环己烷共沸蒸馏脱除；将酯化反应产物精馏后得到二丙二醇甲醚醋酸酯，精馏后的釜液含催化剂和部分二丙二醇甲醚醋酸酯循环使用。本发明方法催化剂活性高，稳定性好，对设备腐蚀性低，催化剂可循环使用。

  公开号：

  CN106966898B

文献信息

• ANTIREFLECTIVE COMPOSITIONS WITH THERMAL ACID GENERATORS
  申请人：Rohm and Haas Electronic Materials Korea Ltd.

  公开号：US20190085173A1

  公开（公告）日：2019-03-21

  New methods and substrates are provided that include antireflective compositions that comprise one or more thermal acid generators.

  提供了包括一个或多个热酸发生剂的防反射组分的新方法和基板。
• MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20210286266A1

  公开（公告）日：2021-09-16

  The present invention is a material for forming an organic film, including: a compound shown by the following general formula (1); and an organic solvent, where in the general formula (1), X represents an organic group with a valency of “n” having 2 to 50 carbon atoms or an oxygen atom, “n” represents an integer of 1 to 10 , and R 1 independently represents any of the following general formulae (2), where in the general formulae (2), broken lines represent attachment points to X, and Q 1 represents a monovalent organic group containing a carbonyl group, at least a part of which is a group shown by the following general formulae (3), where in the general formulae (3), broken lines represent attachment points, X 1 represents a single bond or a divalent organic group having 1 to 20 carbon atoms optionally having a substituent when the organic group has an aromatic ring, R 2 represents a hydrogen atom, a methyl group, an ethyl group, or a phenyl group, and ** represents an attachment point. An object of the present invention is to provide a material for forming an organic film for forming an organic film having dry etching resistance, and also having high filling and planarizing properties and adhesion to a substrate.

  本发明是一种用于形成有机薄膜的材料，包括：由以下通用式（1）所示的化合物；和有机溶剂，在通用式（1）中，X代表具有2至50个碳原子或一个氧原子的价为“n”的有机基团，“n”表示1到10的整数，R1独立地表示以下通用式（2）中的任何一种，其中在通用式（2）中，虚线表示连接点到X，Q1表示含有羰基的一价有机基团，其中至少部分是以下通用式（3）所示的基团，其中在通用式（3）中，虚线表示连接点，X1表示单键或具有1到20个碳原子的二价有机基团，在有机基团具有芳香环时可选地具有取代基，R2表示氢原子、甲基基团、乙基基团或苯基团，**表示连接点。本发明的目的是提供一种用于形成具有干法刻蚀抗性的有机薄膜的材料，同时具有高填充和平整化性能以及对基底的粘附性。
• COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST
  申请人：Amara John P.

  公开号：US20110003250A1

  公开（公告）日：2011-01-06

  In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

  在一个方面，提供了有机涂层组合物，特别是抗反射涂层组合物，其包括二烯/二烯亲双反应产物。在另一个方面，提供了有机涂层组合物，特别是抗反射涂层组合物，其包括一个含有羟基-萘甲基团的组分，例如6-羟基-2-萘甲基团。本发明的优选组合物可用于减少曝光辐射从基板反射回覆盖的光刻胶层，并/或作为平坦化、整平或填孔层。
• BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20160340374A1

  公开（公告）日：2016-11-24

  An object of the present invention is to provide a compound which is capable of attaining a composition having high storage stability without reacting with a base-reactive compound, even in the case of storage for a long period of time in a mixed state with the base-reactive compound, such as an epoxy-based compound, as well as capable of generating a strong base (guanidines, biguanides, phosphazenes or phosphoniums) by irradiation of light (active energy rays) or heating; a base generator comprising the compound; and a base-reactive composition comprising the base generator and the base-reactive compound. The present invention relates to the compound represented by the general formula (A); the base generator comprising the compound; and the base-reactive composition comprising the base generator and the base-reactive compound. (wherein R 1 represents an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; an alkenyl group; a 2-furylethynyl group; a 2-thiophenylethynyl group; or a 2,6-dithianyl group; R 2 to R 4 each independently represent an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; the aryl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; a furanyl group; a thienyl group; or an N-alkyl-substituted pyrrolyl group; Z + represents an ammonium cation having a guanidinium group, a biguanidium group or a phosphazenium group, or a phosphonium cation.)

  本发明的目的是提供一种化合物，能够在与碱反应性化合物混合状态长时间存储的情况下，仍能获得具有高储存稳定性的组合物，而不与碱反应性化合物发生反应，同时还能通过光照（活性能量射线）或加热产生强碱（胍胺、双胍胺、磷氮烷或磷銨）；包括该化合物的碱发生器；以及包括该碱发生器和碱反应性化合物的碱反应性组合物。本发明涉及由通式（A）表示的化合物；包括该化合物的碱发生器；以及包括该碱发生器和碱反应性化合物的碱反应性组合物。（其中R1代表烷基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基炔基；烯基；2-呋喃基炔基；2-噻吩基炔基；或2,6-二硫基基；R2到R4各自独立地代表烷基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基炔基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基；呋喃基；噻吩基；或N-烷基取代的吡咯基；Z+代表具有胍胺基团、双胍胺基团或磷氮烷基团的铵阳离子，或磷銨阳离子。）
• Acid- and radical-generating agent and method for generating acid and radical
  申请人：FUJIFILM Wako Pure Chemical Corporation

  公开号：US10451967B2

  公开（公告）日：2019-10-22

  It is a subject of the present invention to provide an acid- and radical-generating agent which has high sensitivity to an active energy ray having a wavelength of around 300 to 450 nm, and can exert both high acid-generating performance and high radical-generating performance, and has heat resistance; and a method for generating an acid and a radical. The present invention relates to a compound represented by the general formula (A); an acid- and radical-generating agent comprising the compound; and a method for generating an acid and a radical: wherein n pieces of R1 each independently represent an alkyl group, which may have a specific functional group in the chain, or in which a hydrogen atom may be substituted by a halogen atom; an alkoxy group, in which a hydrogen atom may be substituted by a halogen atom; an aryl group or an aryloxy group, in which a hydrogen atom may be substituted by a halogen atom, an alkyl group or a haloalkyl group; or an arylalkyl group or an arylalkyloxy group, in which a hydrogen atom may be substituted by a halogen atom, an alkyl group or a haloalkyl group; n pieces of R2 and R3 each independently represent a hydrogen atom, an alkyl group or an alkoxycarbonyl group; R4 to R7 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an alkoxycarbonyl group, a dialkylamino group or a nitro group; Y represents an oxygen atom, a sulfur atom, or a carbonyl group; n pieces of Z each independently represent a sulfonyl group or an alkoxyphosphoryl group; n represents 1 or 2.

  本发明的一个目的是提供一种对波长约为300至450纳米的活性能量射线具有高灵敏度的酸和自由基生成剂，能够发挥高酸生成性能和高自由基生成性能，并具有耐热性；以及一种生成酸和自由基的方法。本发明涉及一种由通式（A）表示的化合物；包括该化合物的酸和自由基生成剂；以及生成酸和自由基的方法：其中n个R1分别独立表示一种烷基基团，该烷基基团可能在链中具有特定的功能基团，或者氢原子可能被卤原子取代；一种烷氧基团，其中氢原子可能被卤原子取代；一种芳基或芳氧基，其中氢原子可能被卤原子，烷基或卤代烷基取代；或一种芳基烷基或芳基氧基，其中氢原子可能被卤原子，烷基或卤代烷基取代；n个R2和R3分别独立表示氢原子，烷基基团或烷氧羰基团；R4到R7分别独立表示氢原子，卤原子，烷基基团，烷氧基团，烯基基团，芳基，烷氧羰基团，二烷基氨基团或硝基；Y表示氧原子，硫原子或羰基；n个Z分别独立表示磺酰基或烷氧基磷酰基；n表示1或2。