α-acetoxy-γ-butyrolactone | 19405-99-3

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: α-acetoxy-γ-butyrolactone
• 英文别名: (2-oxooxolan-3-yl) Acetate
• CAS: 19405-99-3
• 化学式: C₆H₈O₄
• mdl: MFCD22418187
• 分子量: 144.127
• InChiKey: SNZQJSZZDOZNGW-UHFFFAOYSA-N

物化性质

• 沸点：
  94 °C(Press: 0.2 Torr)
• 密度：
  1.23±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.2
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.666
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  α-溴-γ-丁内酯 在 silver(I) acetate 作用下， 以 乙腈 为溶剂， 反应 24.0h， 以93%的产率得到α-acetoxy-γ-butyrolactone
  参考文献：
  名称：

  乙酸银介导的卤代烷的乙酰氧基化

  摘要：

  摘要 乙酸银在中性反应条件下促进卤代烷的乙酰氧基化。该反应适用于伯和活化的仲烷基卤化物和2，2-二溴苯乙酮，以高收率制备相应的乙酸酯。可以耐受底物上酯，酰胺，腈，羟基和OTBDMS功能的存在。 乙酸银在中性反应条件下促进卤代烷的乙酰氧基化。该反应适用于伯和活化的仲烷基卤化物和2，2-二溴苯乙酮，以高收率制备相应的乙酸酯。可以耐受底物上酯，酰胺，腈，羟基和OTBDMS功能的存在。

  DOI：

  10.1055/s-0033-1338551

文献信息

• HEMIACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20160238930A1

  公开（公告）日：2016-08-18

  A polymer for resist use is obtainable from a hemiacetal compound having formula (1 a ) wherein R 1 is H, CH 3 or CF 3 , R 2 to R 4 each are H or a monovalent hydrocarbon group, X 1 is a divalent hydrocarbon group, ZZ designates a non-aromatic mono- or polycyclic ring of 4 to 20 carbon atoms having a hemiacetal structure, k 1 =0 or 1, and k 2 =0 to 3. A resist composition comprising the polymer displays controlled acid diffusion and low roughness during both positive and negative tone developments.

  从具有以下式（1a）的半缩醛化合物获得用于抗蚀的聚合物，其中R1为H、CH3或CF3，R2至R4分别为H或单价碳氢基团，X1为二价碳氢基团，ZZ表示具有半缩醛结构的非芳香性4至20个碳原子的单环或多环环，k1=0或1，k2=0至3。包含该聚合物的抗蚀组合物显示出在正片和负片显影过程中控制酸扩散和低粗糙度。
• PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION
  申请人：Wada Kenji

  公开号：US20100233617A1

  公开（公告）日：2010-09-16

  A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X—B—R   (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

  一种感光组合物包括：（A）含有与下式（I）所表示的化合物对应的重复单元的树脂；该树脂能够在受到光敏射线或辐射照射后产生酸基团：Z-A-X—B—R   （I）其中Z代表一个能够在受到光敏射线或辐射照射后由阳离子离去而形成酸基团的基团；A代表一个烷基基团；X代表一个单键或含杂原子的二价连接基团；B代表一个单键、一个氧原子或—N（Rx）-；Rx代表一个氢原子或一个一价有机基团；R代表一个通过Y取代的一价有机基团；当B代表—N（Rx）-时，R和Rx可以结合在一起形成一个环；Y代表一个可聚合的基团。
• Formation of δ-Lactones by Cyanide Catalyzed Rearrangement of α-Hydroxy-β-oxoesters
  作者：David Kieslich、Jens Christoffers

  DOI：10.1021/acs.orglett.0c04157

  日期：2021.2.5

  δ-Valerolactone derivatives are formed by cyanide-catalyzed ring-transformation of cyclic α-hydroxy-β-oxoesters. This unprecedented reaction defines a new synthetic methodology, and the products are obtained in up to quantitative yields. Several alkyl substitutions as well as different ester residues are tolerated. Furthermore, benzo- and heteroarene-annulated starting materials are converted without

  δ-戊内酯衍生物是由氰化物催化的环状α-羟基-β-氧代酯环化反应形成的。这种空前的反应定义了一种新的合成方法，并且可以以定量收率获得产物。允许几个烷基取代以及不同的酯残基。此外，苯并和杂亚芳基环化的起始原料可以毫无问题地转化。另外一个好处是，可以通过容易获得的β-氧代酯的铈催化好氧α-羟基化直接获得原料。
• PHOTOACID-GENERATING COMPOUND AND ASSOCIATED POLYMER, PHOTORESIST COMPOSITION, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20180095363A1

  公开（公告）日：2018-04-05

  A photoacid-generating compound has the structure wherein m, n, R 1 , R 2 , X, Y, and Z − are defined herein. The photoacid-generating compound exhibits strong absorption and chemical sensitivity to extreme ultraviolet radiation, while also absorbing longer wavelengths with desirably reduced chemical sensitivity. Also described are a polymer incorporating the residue of a polymerizable version of the photoacid-generating compound, a photoresist composition that includes the photoacid-generating compound, the polymer, or a combination thereof, and a method of forming a photoresist relief image using the photoresist composition.

  一种光酸生成化合物具有结构，其中m、n、R1、R2、X、Y和Z−在此处定义。该光酸生成化合物对极紫外辐射具有强吸收和化学敏感性，同时还吸收较长波长并具有较低的化学敏感性。还描述了一种聚合物，其中包含可聚合版本的光酸生成化合物的残留物，一种包含该光酸生成化合物、聚合物或两者组合的光阻剂组合物，以及使用该光阻剂组合物形成光阻剂
• ONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20160320698A1

  公开（公告）日：2016-11-03

  An onium salt having an anion moiety of a specific structure is an effective photoacid generator. A resist composition comprising the onium salt has the advantages of compatibility and reduced acid diffusion and forms a pattern with a good balance of sensitivity and MEF, rectangularity, and minimal defects.

  具有特定结构的阴离子基团的醇盐是一种有效的光酸发生剂。包含该醇盐的抗蚀组合物具有兼容性和减少酸扩散的优点，并形成具有良好灵敏度和MEF、矩形度以及最小缺陷的图案。