申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US20220121117A1
公开(公告)日:2022-04-21
A resist composition that generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, which contains a resin component (A1) exhibiting changed solubility in a developing solution under action of acid, the resin component (A1) has a constitutional unit (a01) derived from a compound represented by General Formula (a0-1), W
01
represents a polymerizable group-containing group, Ya
01
represents a single bond or a divalent linking group, Ra
01
represents a cyclic acid dissociable group, q represents an integer in a range of 0 to 3, and n represents an integer of 1 or more, provided that n≤q×2+4 is satisfied