tetramethylammonium octanoate | 53202-59-8

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: tetramethylammonium octanoate
• 英文别名: octanoate;tetramethylazanium
• CAS: 53202-59-8
• 化学式: C₄H₁₂N*C₈H₁₅O₂
• 分子量: 217.352
• InChiKey: DMYOTDXFCYFGEK-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  1.42
• 重原子数：
  15
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  40.1
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  福美锌 、 tetramethylammonium octanoate 以 丙酮 为溶剂， 生成 、 zinc(II) octanoate
  参考文献：
  名称：

  Aspects of the inorganic chemistry of rubber vulcanisation. Part 1. Reactions of zinc bis(dithiocarbamates) and bis(benzothiazole-2-thiolates) with carboxylates, and the structure of [NBuⁿ₄][{Zn(S₂-CNMe₂)₂}₂(µ-OCOMe)]

  摘要：

  DOI：

  10.1039/dt9800001939
• 作为产物：
  描述：

  sodium caprylate 、 四甲基氯化铵 以 水 为溶剂， 以96%的产率得到tetramethylammonium octanoate
  参考文献：
  名称：

  마이크로리엑터를 사용한 카르복실산 음이온을 갖는 이온성 액체의 제조방법

  摘要：

  This invention relates to a method for producing an ionic liquid containing carboxylic acid anions using a microreactor. More specifically, the invention relates to a method for efficiently producing an ionic liquid with carboxylic acid anions, as shown in Figure 1, by substituting sodium butanoate, sodium 2-ethylhexanoate, and sodium octanoate with cations such as 1-alkyl-3-methylimidazolium, 1,1-alkylmethylpyrrolidinium, 1,2-dimethyl-3-alkylimidazolium, 1-alkyl-3-methylpyridinium, and tetramethylammonium through substitution reactions. The ionic liquid produced according to this invention is of high purity, containing residual halides of less than 10 ppm, and has high electrical conductivity, making it suitable for use as an electrolyte and in capacitors.

  公开号：

  KR20160026982A
• 作为试剂：
  描述：

  异氰酸苯酯 在 tetramethylammonium octanoate 、 正丁醇 作用下， 以 乙腈 为溶剂， 生成 triphenyl isocyanurate
  参考文献：
  名称：

  Schwetlick, Klaus; Noack, Rainer, Journal of the Chemical Society. Perkin transactions II, 1995, # 2, p. 395 - 402

  摘要：

  DOI：

文献信息

• METHOD FOR PREPARING IONIC LIQUID HAVING CARBOXYLIC ACID ANION USING MICROREACTOR
  申请人：CHEMTECH RESEARCH INCORPORATION

  公开号：US20160254098A1

  公开（公告）日：2016-09-01

  The present invention relates to a method for preparing an ionic liquid having a carboxylic acid anion using a microreactor. More specifically, the present invention relates to a method for preparing, with high efficiency, an ionic liquid having a carboxylic acid anion as shown in FIG. 1, by having sodium butanoate, sodium 2-ethylhexanoate, or sodium octanoate undergo a substitution reaction with 1-alkyl-3-methylimidazolium, 1,1-alkylmethylpyrrolidinium, 1,2-dimethyl-3-alkylimidazolium, 1-alkyl-3-methylpyridinium, or tetramethylammonium, each of which being a cation. The ionic liquid prepared according to the present invention has high purity, containing residual halide at less than 10 ppm, and has high electrical conductivity, and therefore is capable of being used as an electrolyte or for a condenser.

  本发明涉及一种使用微反应器制备具有羧酸阴离子的离子液体的方法。更具体地说，本发明涉及通过使丁酸钠、2-乙基己酸钠或辛酸钠与1-烷基-3-甲基咪唑、1,1-烷基甲基吡咯烷、1,2-二甲基-3-烷基咪唑、1-烷基-3-甲基吡啶或四甲基铵发生取代反应来高效制备具有羧酸阴离子的离子液体，如图1所示。根据本发明制备的离子液体具有高纯度，在10 ppm以下含有残留卤化物，并具有高电导率，因此可用作电解质或电容器。
• COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE
  申请人：MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.

  公开号：EP1568744A1

  公开（公告）日：2005-08-31

  A composition for film formation from which a porous film excelling in dielectric characteristics, adherence, coating film uniformity and mechanical strength and realizing reduced moisture absorption can be prepared; a porous film and a process for producing the same; and a highly reliable semiconductor device of high performance wherein the porous film is incorporated. In particular, a composition for porous film formation, obtained by adding to a siloxane polymer at least one quaternary ammonium salt represented by the general formula: [(R<1>)4N]<+>[R<2>X]<-> (1), or Hk[(R<1>)4N]m<+>Y (2) wherein X represents CO2, OSO3 or SO3; Y represents SO4, SO3, CO3, O2C-CO2, NO3 or NO2; k is 0 or 1; each of m and n is 1 or 2; when n=1, k=0 and m=1; and when n=2, either k=0 and m=2, or k=1 and m=1.

  一种可制备介电特性、附着力、涂膜均匀性和机械强度优异的多孔膜并实现降低吸湿性的成膜用组合物；一种多孔膜及其生产工艺；以及一种含有该多孔膜的高性能高可靠性半导体器件。特别是一种用于形成多孔薄膜的组合物，它是通过向硅氧烷聚合物中添加至少一种由通式表示的季铵盐而获得的：[(R)4N][RX](1)，或 Hk[(R)4N]mY (2)，其中 X 代表 CO2、OSO3 或 SO3；Y 代表 SO4、SO3、CO3、O2C-CO2、NO3 或 NO2；k 为 0 或 1；m 和 n 各为 1 或 2；当 n=1 时，k=0，m=1；当 n=2 时，或者 k=0，m=2，或者 k=1，m=1。
• Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
  申请人：Shinetsu Chemical Co., Ltd.

  公开号：EP1845132A2

  公开（公告）日：2007-10-17

  A silicon-containing film is formed from a heat curable composition comprising (A) a silicon-containing compound obtained by effecting hydrolytic condensation of a hydrolyzable silicon compound in the presence of an acid catalyst, and substantially removing the acid catalyst from the reaction mixture, (B) a hydroxide or organic acid salt of lithium, sodium, potassium, rubidium or cesium, or a sulfonium, iodonium or ammonium compound, (C) an organic acid, and (D) an organic solvent. The silicon-containing film allows an overlying photoresist film to be patterned effectively. The composition is effective in minimizing the occurrence of pattern defects after lithography and is shelf stable.

  含硅薄膜由一种热固化组合物形成，该组合物包括：(A) 一种含硅化合物，该化合物是通过在酸催化剂存在下使一种可水解的硅化合物发生水解缩合，并从反应混合物中基本除去酸催化剂而获得；(B) 锂、钠、钾、铷或铯的氢氧化物或有机酸盐，或一种锍、碘或铵化合物；(C) 一种有机酸；以及 (D) 一种有机溶剂。含硅薄膜可以有效地将上覆的光刻胶薄膜图案化。该组合物能有效地减少光刻后图案缺陷的出现，并具有货架稳定性。
• New trimer catalyst additives for improving foam processability
  申请人：Air Products and Chemicals, Inc.

  公开号：EP1852450A2

  公开（公告）日：2007-11-07

  The present invention provides trimerization catalyst compositions and methods to produce a polyisocyanurate/polyurethane foam using such trimerization catalyst compositions. The catalyst composition is the contact product of at least one α,β-unsaturated carboxylate salt and at least one second carboxylate salt.

  本发明提供了三聚催化剂组合物和使用这种三聚催化剂组合物生产聚异氰酸酯/聚氨酯泡沫塑料的方法。催化剂组合物是至少一种α，β-不饱和羧酸盐和至少一种第二羧酸盐的接触产物。
• Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2063319A1

  公开（公告）日：2009-05-27

  A metal oxide-containing film is formed from a heat curable composition comprising (A) a metal oxide-containing compound obtained through hydrolytic condensation between a hydrolyzable silicon compound and a hydrolyzable metal compound, (B) a hydroxide or organic acid salt of Li, Na, K, Rb or Cs, or a sulfonium, iodonium or ammonium compound, (C) an organic acid, and (D) an organic solvent. The metal oxide-containing film ensures effective pattern formation.

  一种含金属氧化物的薄膜由一种热固化组合物形成，该组合物包括：(A) 通过可水解硅化合物和可水解金属化合物之间的水解缩合获得的含金属氧化物化合物；(B) Li、Na、K、Rb 或 Cs 的氢氧化物或有机酸盐，或锍、碘或铵化合物；(C) 有机酸；以及 (D) 有机溶剂。含金属氧化物的薄膜可确保有效的图案形成。