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1,1,1,2,3,3-hexafluoro-4-(1,1,2,3,3,3-hexafluoropropoxy)pentane | 870778-34-0

中文名称
——
中文别名
——
英文名称
1,1,1,2,3,3-hexafluoro-4-(1,1,2,3,3,3-hexafluoropropoxy)pentane
英文别名
Novec 7600;Pentane, 1,1,1,2,3,3-hexafluoro-4-(1,1,2,3,3,3-hexafluoropropoxy)-
1,1,1,2,3,3-hexafluoro-4-(1,1,2,3,3,3-hexafluoropropoxy)pentane化学式
CAS
870778-34-0
化学式
C8H6F12O
mdl
——
分子量
346.116
InChiKey
TZMQCOROQZMJIS-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    137.1±40.0 °C(Predicted)
  • 密度:
    1.481±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    5
  • 重原子数:
    21
  • 可旋转键数:
    5
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    9.2
  • 氢给体数:
    0
  • 氢受体数:
    13

SDS

SDS:74c62d5ba2d592d8123895e59ce5521c
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反应信息

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文献信息

  • Orthogonal Procesing of Organic Materials Used in Electronic and Electrical Devices
    申请人:Ober Christopher K.
    公开号:US20110159252A1
    公开(公告)日:2011-06-30
    An orthogonal process for photolithographic patterning organic structures is disclosed. The disclosed process utilizes fluorinated solvents or supercritical CO 2 as the solvent so that the performance of the organic conductors and semiconductors would not be adversely affected by other aggressive solvent. One disclosed method may also utilize a fluorinated photoresist together with the HFE solvent, but other fluorinated solvents can be used. In one embodiment, the fluorinated photoresist is a resorcinarene, but various fluorinated polymer photoresists and fluorinated molecular glass photoresists can be used as well. For example, a copolymer perfluorodecyl methacrylate (FDMA) and 2-nitrobenzyl methacrylate (NBMA) is a suitable orthogonal fluorinated photoresist for use with fluorinated solvents and supercritical carbon dioxide in a photolithography process. The combination of the fluorinated photoresist and the fluorinated solvent provides a robust, orthogonal process that is yet to be achieved by methods or devices known in the art.
    本文介绍了一种用于光刻有机结构的正交工艺。该工艺利用氟化溶剂或超临界CO2作为溶剂,以使有机导体和半导体的性能不受其他侵蚀性溶剂的不利影响。其中一种方法还可以使用氟化光阻与HFE溶剂结合使用,但也可以使用其他氟化溶剂。在一种实施例中,氟化光阻是一种二苯并呋喃酮,但也可以使用各种氟化聚合物光阻和氟化分子玻璃光阻。例如,一种共聚物全氟癸基甲基丙烯酸酯(FDMA)和2-硝基苯甲酸甲酯(NBMA)是用于与氟化溶剂和超临界二氧化碳在光刻工艺中使用的适用于正交的氟化光阻。氟化光阻和氟化溶剂的组合提供了一种强大的正交工艺,这种工艺尚未被已知的方法或设备实现。
  • [EN] CATALYSED SYNTHESIS OF FLUORINATED ALKENES AND FLUORINATED ALKENE COMPOSITIONS<br/>[FR] SYNTHÈSE CATALYSÉE D'ALCÈNES FLUORÉS ET COMPOSITIONS D'ALCÈNE FLUORÉ
    申请人:CHEMOURS CO FC LLC
    公开号:WO2021119078A1
    公开(公告)日:2021-06-17
    A method of producing a fluoroolefin includes contacting a compound of formula (1), RfCX1=CHCF3, with a fluorinated ethylene compound of formula (2), CX2X3=CX4X5 in the presence of a catalyst. In the compound of formula (1), Rf is a linear or branched C1-C10 perfluorinated alkyl group and X1 is H, Br, Cl, or F. In the compound of formula (2), X2, X3, X4, and X5 are each independently H, Br, Cl, or F and at least three of X2, X3, X4, and X5 are F. The resulting composition comprises a compound of formula (3), Rf(CF2)nCX6=CH(CF2)mCX7X8CFX9X10. In the compound of formula (3), X6, X7, X8, X9, and X10 are each independently H, Br, Cl, or F, and the total number of each of H, Br, Cl, and F corresponds to the total number of each of H, Br, Cl, and F provided by the compounds of formulae (1) and (2).
    一种制备氟代烯烃的方法,包括在催化剂的存在下,将式(1)化合物RfCX1=CHCF3与式(2)氟代乙烯化合物CX2X3=CX4X5接触。在式(1)的化合物中,Rf是线性或支链的C1-C10全氟烷基,X1是H、Br、Cl或F。在式(2)的化合物中,X2、X3、X4和X5分别是H、Br、Cl或F,并且至少三个X2、X3、X4和X5是F。得到的组合物包括式(3)化合物Rf(CF2)nCX6=CH(CF2)mCX7X8CFX9X10。在式(3)的化合物中,X6、X7、X8、X9和X10分别是H、Br、Cl或F,并且H、Br、Cl和F的总数对应于式(1)和(2)的化合物提供的H、Br、Cl和F的总数。
  • PROCESS FOR THERMALLY STABLE OLEOPHOBIC LOW ADHESION COATING FOR INKJET PRINTHEAD FRONT FACE
    申请人:Sambhy Varun
    公开号:US20130280431A1
    公开(公告)日:2013-10-24
    A coating for an ink jet printhead front face, wherein the coating comprises an oleophobic low adhesion coating having high thermal stability as indicated by less than about 15 percent weight loss when heated to up to 300° C., and wherein a drop of ultra-violet (UV) gel ink or a drop of solid ink exhibits a contact angle of greater than about 50° and sliding angle of less than about 30° with a surface of the coating, wherein the coating maintains the contact angle and sliding angle after the coating has been exposed to a temperature of at least 260° C. for at least 30 minutes.
    一种喷墨打印头正面的涂层,其中涂层包括具有高热稳定性的疏水低附着力涂层,当加热至高达300°C时,重量损失不到15%,并且紫外线(UV)凝胶墨水或固体墨水的一滴在涂层表面呈现大于约50°的接触角和小于约30°的滑动角,涂层在至少260°C的温度下暴露至少30分钟后仍然保持接触角和滑动角。
  • CROSS-LINKABLE FLUORINATED PHOTOPOLYMER
    申请人:Orthogonal, Inc.
    公开号:US20150030981A1
    公开(公告)日:2015-01-29
    A photosensitive composition comprises a fluorinated solvent, a photo-acid generator and a copolymer. The copolymer comprises at least three distinct repeating units, including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid-catalyzed cross-linkable group, and a third repeating unit having a sensitizing dye. The composition is useful in the fabrication of electronic devices, especially organic electronic and bioelectronic devices.
    一种光敏组合物包括一种含氟溶剂,一种光酸发生剂和一种共聚物。该共聚物包括至少三个不同的重复单元,包括第一个重复单元具有含氟基团,第二个重复单元具有酸催化交联基团,第三个重复单元具有敏化染料。该组合物在制造电子设备中特别是有机电子和生物电子设备中有用。
  • PROCESS FOR PRODUCING FLUOROCOPOLYMER NANOCOMPOSITE
    申请人:Asahi Glass Company, Limited
    公开号:EP2508564A1
    公开(公告)日:2012-10-10
    To provide a process for producing a fluorinated copolymer nanocomposite comprising a fluorinated copolymer and inorganic fine particles dispersed therein to a high degree, and a process for producing a molded fluororesin product. The process for producing a fluorinated copolymer nanocomposite comprising a fluorinated copolymer and inorganic fine particles, characterized in that a mixture (A) containing a fluorinated copolymer comprised of repeating units based on tetrafluoroethylene and repeating units based on ethylene, inorganic fine particles, and a solvent which can dissolve the fluorinated copolymer under ordinary or elevated pressure at a temperature of not higher than the melting point of the fluorinated copolymer, is heated to at least a temperature at which the fluorinated copolymer dissolves in the solvent, and the solvent is subsequently removed. The process for producing a molded fluororesin product by using the fluorinated copolymer nanocomposite to produce a molded product.
    提供一种生产由含氟共聚物和高度分散于其中的无机微粒组成的含氟共聚物纳米复合材料的工艺,以及一种生产模塑氟树脂产品的工艺。 生产包含含氟共聚物和无机微粒的含氟共聚物纳米复合材料的工艺,其特征在于混合物 (A) 包含由基于四氟乙烯的重复单元和基于乙烯的重复单元组成的含氟共聚物、无机微粒、和一种溶剂,该溶剂可在不高于氟化共聚物熔点的温度下,在普通或高压条件下溶解氟化共聚物,将该混合物加热至至少使氟化共聚物溶解在溶剂中的温度,然后除去溶剂。使用含氟共聚物纳米复合材料生产模塑氟树脂产品的工艺。
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