(1,1,2,3,3,3-hexafluoro-propyl)-isopropyl ether | 357-97-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: (1,1,2,3,3,3-hexafluoro-propyl)-isopropyl ether
• 英文别名: (1,1,2,3,3,3-Hexafluor-propyl)-isopropyl-aether；1,1,1,2,3,3-Hexafluoro-3-propan-2-yloxypropane
• CAS: 357-97-1
• 化学式: C₆H₈F₆O
• 分子量: 210.119
• InChiKey: SDZNYKJYIDUUKH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  13
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  7

反应信息

• 作为产物：
  描述：

  六氟丙烯 、 异丙醇 在 氢氧化钾 作用下， 以88%的产率得到(1,1,2,3,3,3-hexafluoro-propyl)-isopropyl ether
  参考文献：
  名称：

  Synthesis and Use of Partially Fluorinated Dialkyl Ethers Derived from Hexafluoropropylene

  摘要：

  A procedure was developed for preparing partially fluorinated dialkyl ethers by the reaction of hexafluoropropylene with aliphatic and polyfluorinated alcohols in the presence of KOH. On treatment with concentrated sulfuric acid, these ethers form alkyl esters of acids, and on treatment with KOH, alkenyl ethers.

  DOI：

  10.1023/b:rjac.0000024585.14553.5f

文献信息

• METHOD FOR PRODUCING FLUORINE-CONTAINING CARBOXYLIC ACID ESTER
  申请人：Central Glass Company, Limited

  公开号：EP2161249A1

  公开（公告）日：2010-03-10

  [Task] It is to provide a production method that the target fluorine-containing carboxylic acid ester can be obtained from a fluorine-containing ether by a one-step reaction, that a complicated step and a troublesome operation are not necessary, and that an excessive energy is not consumed. [Solving Means] A fluorine-containing carboxylic acid ester represented by the general formula R1HCFCOOR2 is produced by reacting a fluorine-containing ether represented by the general formula R1HCFCF2OR2 (R1 represents either of a fluorine atom and a C1-4 perfluoroalkyl group, and R2 represents a monovalent organic group) with water in the presence of a solid catalyst.

  [任务]提供一种生产方法，它可以通过一步反应从含氟醚中获得目标含氟羧酸酯，不需要复杂的步骤和麻烦的操作，也不会消耗过多的能量。 [解决方法]通式 R1HCFCOOR2 所代表的含氟羧酸酯是由通式 R1HCFCF2OR2 所代表的含氟醚（R1 代表氟原子和 C1-4 全氟烷基中的任一个，R2 代表一价有机基团）在固体催化剂存在下与水反应制得的。
• Knunjanz et al., Izvestiya Akademii Nauk SSSR, Seriya Khimicheskaya, 1953, p. 282,288;engl.Ausg.S.255,259
  作者：Knunjanz et al.

  DOI：——

  日期：——
• Method for Producing Fluorine-Containing Carboxylic Acid Ester
  申请人：Kondo Takeshi

  公开号：US20100197957A1

  公开（公告）日：2010-08-05

  [Task] It is to provide a production method that the target fluorine-containing carboxylic acid ester can be obtained from a fluorine-containing ether by a one-step reaction, that a complicated step and a troublesome operation are not necessary, and that an excessive energy is not consumed. [Solving Means] A fluorine-containing carboxylic acid ester represented by the general formula R 1 HCFCOOR 2 is produced by reacting a fluorine-containing ether represented by the general formula R 1 HCFCF 2 OR 2 (R 1 represents either of a fluorine atom and a C 1-4 perfluoroalkyl group, and R 2 represents a monovalent organic group) with water in the presence of a solid catalyst.
• Composition for Forming Films, Film Produced from Said Composition, and Method for Producing Organic Semiconductor Element Using Said Composition
  申请人：CENTRAL GLASS COMPANY, LIMITED

  公开号：US20160164047A1

  公开（公告）日：2016-06-09

  A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the formula (1) and a repeating unit of the general formula (2); and a fluorine-containing solvent. In the general formula (2), R 1 represents a C 1 -C 15 straight, C 3 -C 15 branched or C 3 -C 15 cyclic hydrocarbon group in which at least one hydrogen atom may be replaced by a fluorine atom or chlorine atom and which may have a hydroxy group. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element as the composition can form a fluororesin film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.
• Film-Forming Composition, Film Formed Thereby, and Method for Manufacturing Organic Semiconductor Element Using Same
  申请人：CENTRAL GLASS COMPANY, LIMITED

  公开号：US20160181531A1

  公开（公告）日：2016-06-23

  A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the general formula (1); and a fluorine-containing solvent. In the general formula (1), R 1 each independently represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; and R 2 each independently represents a C 1 -C 15 straight, C 3 -C 15 branched or C 3 -C 15 cyclic fluorine-containing hydrocarbon group in which any hydrogen atom may be replaced by a fluorine atom with the proviso that the repeating unit contains at least one fluorine atom; and This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element because the composition can form a film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.