Polyimide-based resin film cleaning liquid, method for cleaning polyimide-based resin film, method for producing polyimide coating, method for producing filter, filter medium, or filter device, and method for producing chemical solution for lithography
申请人:Tokyo Ohka Kogyo Co., Ltd.
公开号:US10155185B2
公开(公告)日:2018-12-18
A polyimide-based resin film cleaning liquid includes at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, an alkylene glycol monoalkyl ether acetate, and an aprotic polar solvent other than these solvents.
聚酰亚胺基树脂薄膜清洗液包括至少一种溶剂,该溶剂选自羟基脂肪族羧酸酯、脂 肪族羧酸酯、链酮或环酮、烷二醇单烷基醚、烷二醇单烷基醚醋酸酯和除这些溶剂以外的钝极性 溶剂组成的组。