3,5-Dimethyl-3-methoxyhexen-(1) | 50426-67-0

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 3,5-Dimethyl-3-methoxyhexen-(1)
• 英文别名: 3-methoxy-3,5-dimethyl-hex-1-ene；3-Methoxy-3,5-dimethylhex-1-ene
• CAS: 50426-67-0
• 化学式: C₉H₁₈O
• 分子量: 142.241
• InChiKey: OWUMERJVMAUDMP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  10
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  异丁酸 、 天然橡胶 以 甲醇 为溶剂， 生成 cis-2,4,7-Trimethylocten-(4) 、 (cis-3,5-Dimethyl-2-hexenyl)-methylaether 、 3,5-Dimethyl-3-methoxyhexen-(1) 、 2,5,8,11-Tetramethyldodecadien-(4,8),cis-cis
  参考文献：
  名称：

  Bruno,F.; Dubois,J.-E., Bulletin de la Societe Chimique de France, 1973, p. 2270 - 2275

  摘要：

  DOI：

文献信息

• FLAVOR AND FRAGRANCE FORMULATION (IV)
  申请人：DSM IP ASSETS B.V.

  公开号：US20150208701A1

  公开（公告）日：2015-07-30

  The present invention relates to the use of specific organic compounds as flavor and fragrance material. Furthermore the invention relates to new specific organic compounds, as well as to flavor and fragrance formulations comprising at least one of the specific organic compounds.

  本发明涉及使用特定有机化合物作为香味和芳香材料。此外，本发明涉及新的特定有机化合物，以及至少包括其中一种特定有机化合物的香味和芳香配方。
• RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE
  申请人：Watanabe Takeru

  公开号：US20110195362A1

  公开（公告）日：2011-08-11

  There is disclosed a resist underlayer film composition of a multilayer resist film used in lithography including (A) a fullerene derivative having a carboxyl group protected by a thermally labile group and (B) an organic solvent. There can be a resist underlayer film composition of a multilayer resist film used in lithography for forming a resist underlayer in which generation of wiggling in substrate etching can be highly suppressed and the poisoning problem in forming an upper layer pattern using a chemically amplified resist can be avoided, a process for forming the resist underlayer film, a patterning process and a fullerene derivative.
• US8835092B2
  申请人：——

  公开号：US8835092B2

  公开（公告）日：2014-09-16
• Bruno,F.; Dubois,J.-E., Bulletin de la Societe Chimique de France, 1973, p. 2270 - 2275
  作者：Bruno,F.、Dubois,J.-E.

  DOI：——

  日期：——