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neopentyl 2-methylbutanoate | 117421-33-7

中文名称
——
中文别名
——
英文名称
neopentyl 2-methylbutanoate
英文别名
2,2-dimethylpropyl 2-methylbutanoate
neopentyl 2-methylbutanoate化学式
CAS
117421-33-7
化学式
C10H20O2
mdl
——
分子量
172.268
InChiKey
NBTQYNGTWJIMPA-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    173.8±8.0 °C(Predicted)
  • 密度:
    0.872±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    3.2
  • 重原子数:
    12
  • 可旋转键数:
    5
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.9
  • 拓扑面积:
    26.3
  • 氢给体数:
    0
  • 氢受体数:
    2

反应信息

  • 作为反应物:
    描述:
    neopentyl 2-methylbutanoate正丁基锂propylcyclohexylamine氧气 作用下, 以 四氢呋喃正己烷 为溶剂, 反应 1.0h, 以33.7%的产率得到neopentyl 2-hydroxy-2-methylbutanoate
    参考文献:
    名称:
    Lindsay Smith, John R.; Nagatomi, Eiji; Waddington, David J., Journal of the Chemical Society. Perkin Transactions 2 (2001), 2000, # 11, p. 2248 - 2258
    摘要:
    DOI:
  • 作为产物:
    描述:
    2-甲基丁酸新戊醇硫酸 作用下, 以 甲苯 为溶剂, 以44.7%的产率得到neopentyl 2-methylbutanoate
    参考文献:
    名称:
    Smith, John R. Lindsay; Nagatomi, Eiji; Stead, Angela, Journal of the Chemical Society. Perkin transactions II, 2000, # 6, p. 1193 - 1198
    摘要:
    DOI:
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文献信息

  • PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    申请人:FUJIFILM Corporation
    公开号:US20160041465A1
    公开(公告)日:2016-02-11
    The pattern forming method includes (1) forming a film using an active light sensitive or radiation sensitive resin composition, (2) exposing the film to active light or radiation, and (3) developing the exposed film using a developer including an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) having a group which generates a polar group by being decomposed due to the action of an acid, the resin (A) has a phenolic hydroxyl group and/or a phenolic hydroxyl group protected with a group leaving due to the action of an acid, and the developer including the organic solvent contains an additive which forms at least one interaction of an ionic bond, a hydrogen bond, a chemical bond, and a dipole interaction, with the polar group.
  • Smith, John R. Lindsay; Nagatomi, Eiji; Stead, Angela, Journal of the Chemical Society. Perkin transactions II, 2000, # 6, p. 1193 - 1198
    作者:Smith, John R. Lindsay、Nagatomi, Eiji、Stead, Angela、Waddington, David J.、Beviere, Stephane D.
    DOI:——
    日期:——
  • Lindsay Smith, John R.; Nagatomi, Eiji; Waddington, David J., Journal of the Chemical Society. Perkin Transactions 2 (2001), 2000, # 11, p. 2248 - 2258
    作者:Lindsay Smith, John R.、Nagatomi, Eiji、Waddington, David J.
    DOI:——
    日期:——
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