dicyclohex-3-enyl ether | 127505-63-9

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: dicyclohex-3-enyl ether
• 英文别名: 4-Cyclohex-3-en-1-yloxycyclohexene
• CAS: 127505-63-9
• 化学式: C₁₂H₁₈O
• 分子量: 178.274
• InChiKey: CCNXPLLJWHBEFS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  3-cyclohexen-1-ol 生成 dicyclohex-3-enyl ether
  参考文献：
  名称：

  MARTON, DANIELE;SLAVIERO, PIERANGELO;TAGLIAVINI, GIUSEPPE, TETRAHEDRON, 45,(1989) N2, C. 7099-7108

  摘要：

  DOI：

文献信息

• Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
  申请人：Feiring E. Andrew

  公开号：US20060167284A1

  公开（公告）日：2006-07-27

  The present invention provides novel fluorine-containing copolymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered heterocyclic ring and, optionally, other components. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The copolymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.

  本发明提供了一种新型的含氟共聚物，其包括至少一种含氟烯烃，至少一种具有融合的4-成员杂环环的多环乙烯不饱和单体，以及可选的其他组分。这些共聚物对于光刻成分特别是用于半导体器件生产中成像的光刻成分（正作用和/或负作用）非常有用。这些共聚物在具有高紫外透明度的光刻成分中特别有用（特别是在短波长，例如157纳米处），这些光刻成分可用作光刻胶的基础树脂，并且潜在地在许多其他应用中也很有用。
• Organotins as etherification catalysts. III. Etherifications and hydro-hydroxy-eliminations promoted by butyltin trichloride
  作者：Daniele Marton、Pierangelo Slaviero、Giuseppe Tagliavini

  DOI：10.1016/s0040-4020(01)89178-x

  日期：——

  Butyltin trichloride, as a catalyst precursor, promotes the following processes: (i) etherification of 2,3-unsaturated alcohols, (ii) etherification of functional diols, (iii) cyclization of 2,5-hexanedione, and (iv) dehydration of cyclic diols. Many examples are reported.

  丁基锡三氯化物作为催化剂前体，可促进以下过程：（i）2,3-不饱和醇的醚化，（ii）功能性二醇的醚化，（iii）2,5-己二酮的环化和（iv）脱水环状二醇。报告了许多示例。
• Photoresists, polymers and processes for microlithography
  申请人：——

  公开号：US20040023150A1

  公开（公告）日：2004-02-05

  Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component. In other embodiments, the photoresists comprise a fluorine-containing copolymer comprising a repeat unit derived from at least one polycyclic ethylenically unsaturated compound having at least one atom or group selected from the group consisting of fluorine atom, perfluoroalkyl group, and perfluoroalkoxy group, characterized in that the at least one atom or group is covalently attached to a carbon atom which is contained within a ring structure and separated from each ethylenically unsaturated carbon atom of the ethylenically unsaturated compound by at least one covalently attached carbon atom. The photoresists have high transparency in the extreme/far UV as well as the near UV, high plasma etch resistance, and are useful for microlithography in the extreme, far, and near ultraviolet (UV) region, particularly at wavelengths ≦365 nm. Novel fluorine-containing copolymers are also disclosed.

  本文揭示了用于极端、远红外和近紫外微影的光阻及相关工艺。在某些实施例中，光阻包括（a）含有氟的共聚物，包括至少一个乙烯基不饱和化合物的重复单元，其特征在于至少一个乙烯基不饱和化合物是多环的，至少一个乙烯基不饱和化合物含有至少一个氟原子共价连接到一个乙烯基不饱和碳原子上；以及（b）至少一个光敏组分。在其他实施例中，光阻包括含有氟的共聚物，包括至少一个多环乙烯基不饱和化合物的重复单元，该乙烯基不饱和化合物具有至少一个来自氟原子、全氟烷基和全氟烷氧基的原子或基团，其特征在于至少一个原子或基团共价连接到一个环结构内的碳原子上，并且与每个乙烯基不饱和碳原子之间至少有一个共价连接的碳原子相隔开。这些光阻在极端/远红外和近紫外具有高透明度，高等离子体蚀刻抗性，并且适用于极端、远红外和近紫外（UV）区域的微影，特别是在波长≤365 nm的情况下。此外，还揭示了新型含氟共聚物。
• Photoroesists Comprising Polymers Derived From Fluoroalcohol-Substituted Polycyclic Monomers
  申请人：Crawford Karl Michael

  公开号：US20070207413A1

  公开（公告）日：2007-09-06

  The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.

  本发明涉及一种新型不饱和多环化合物，其中包含两个氟醇取代基。本发明还涉及从这种不饱和多环化合物衍生出的同聚物和共聚物。这些共聚物可用于光影像组合物，特别是用于制造半导体器件的光阻组合物（正像和/或负像）。这些聚合物在高紫外线透明度（特别是在短波长，例如157nm处）的光阻组合物中特别有用，可用作光阻的基础树脂，潜在地可用于许多其他应用。
• Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide
  申请人：Zannoni Luke

  公开号：US20050170277A1

  公开（公告）日：2005-08-04

  The present invention provides a compound that is a terpolymer of: (a) at least one ethylenically unsaturated linear or branched compound that has at least one fluorine atom covalently coupled thereto; (b) at least one ethylenically unsaturated precursor of a cyclic or polycyclic compound that has at least one fluorine atom covalently coupled thereto forming a cyclic or polycyclic decrystallizing monomer in said terpolymer; and (c) at least one ethylenically unsaturated functional compound which as a monomer in said terpolymer changes solubility upon exposure to an acid or base. Methods of making and using such compounds in photolithography are also described

  本发明提供了一种化合物，它是以下物质的三元共聚物(a) 至少一种乙烯基不饱和线性或支链化合物，其上至少有一个氟原子共价偶联； (b) 至少一种环状或多环化合物的乙烯基不饱和前体，其上至少有一个氟原子共价偶联，在所述三元共聚物中形成环状或多环解晶单体；(c) 至少一种乙烯不饱和官能团化合物，其作为所述三元共聚物中的单体，在接触酸或碱时会改变溶解度。还描述了在光刻技术中制造和使用此类化合物的方法