NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS
申请人:KOBAYASHI Katsuhiro
公开号:US20080124656A1
公开(公告)日:2008-05-29
Sulfonate salts have the formula: R
1
COOCH
2
CH
2
CF
2
CF
2
SO
3
−
M
+
wherein R
1
is alkyl, aryl or hetero-aryl, M
+
is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oxime sulfonates and sulfonyloxyimides derived from these salts are effective photoacid generators in chemically amplified resist compositions.
磺酸盐的化学式为:R1COOCH2CH2CF2CF2SO3−M+,其中R1是烷基、芳基或杂环芳基,M+是Li、Na、K、铵或四甲基铵离子。从这些盐衍生出的季铵盐、肟磺酸盐和磺酰氧基亚胺在化学增强型光刻胶组合物中是有效的光酸发生剂。