2-cyclohexyl-5-phenyl-2H-tetrazole | 140406-56-0

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑类
• 英文名称: 2-cyclohexyl-5-phenyl-2H-tetrazole
• 英文别名: 2H-Tetrazole, 2-cyclohexyl-5-phenyl-；2-cyclohexyl-5-phenyltetrazole
• CAS: 140406-56-0
• 化学式: C₁₃H₁₆N₄
• 分子量: 228.297
• InChiKey: RBURPPYVKCKFBK-UHFFFAOYSA-N

物化性质

• 沸点：
  396.3±25.0 °C(Predicted)
• 密度：
  1.25±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  17
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.46
• 拓扑面积：
  43.6
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  5-苯基四氮唑 、 环己烯 在 硫酸 作用下， 以100%的产率得到2-cyclohexyl-5-phenyl-2H-tetrazole
  参考文献：
  名称：

  Selective N(2)-alkylation of tetrazoles by olefines

  摘要：

  DOI：

  10.1007/bf00484379

文献信息

• Alkylation of 5-substituted NH-tetrazoles by alcohols in the superacid CF3SO3H
  作者：Anna D. Lisakova、Dmitry S. Ryabukhin、Rostislav E. Trifonov、Vladimir A. Ostrovskii、Aleksander V. Vasilyev

  DOI：10.1016/j.tetlet.2015.11.005

  日期：2015.12

  Reactions of 5-substituted NH-tetrazoles with alcohols in the superacid CF3SO3H have been studied. Both the structure of the tetrazole and the nature of alcohol were found to dramatically influence the selectivity of the reaction and yields of products. Tetrazoles bearing phenyl, electron-donating aryl, or benzyl groups at the 5-position, have been alkylated using various alcohols (including MeOH and EtOH) in CF3SO3H upon heating at 60 degrees C for 0.3-12 h to afford 2-alkyl-2H-tetrazoles in 30-98% yields. (C) 2015 Elsevier Ltd. All rights reserved.
• Additions of 5-phenyltetrazole and other heterocyclic NH compounds to olefins
  作者：Alan R. Katritzky、Ming Qi、Adam P. Wells

  DOI：10.1007/bf01169962

  日期：——
• POLISHING COMPOSITION, METHOD FOR PRODUCING SAME, POLISHING METHOD, AND METHOD FOR PRODUCING SUBSTRATE
  申请人：FUJIMI INCORPORATED

  公开号：US20190085208A1

  公开（公告）日：2019-03-21

  To provide a polishing composition capable of polishing objects to be polished, such as simple substance silicon, silicon compounds, and metals, at a high polishing removal rate. The polishing composition contains a polishing removal accelerator containing a compound having a ring structure configured to contain four or more nitrogen atoms, abrasives, and a liquid medium.