2-(2-methyl-3,4-dihydro-1H-isoquinolin-2-ium-2-yl)-1-phenylethanone

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-(2-methyl-3,4-dihydro-1H-isoquinolin-2-ium-2-yl)-1-phenylethanone
• 化学式: C18H20NO+
• 分子量: 266.4
• InChiKey: JBIYBTTWLKQMFZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  20
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.28
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• PHOTORESIST COMPOSITION
  申请人：MASUYAMA Tatsuro

  公开号：US20110091808A1

  公开（公告）日：2011-04-21

  The present invention provides a photoresist composition comprising a compound capable of generating an acid and a base by irradiation, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.