Adamantyl-1-methyl-p-methylphenyl ketone

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: Adamantyl-1-methyl-p-methylphenyl ketone
• 英文别名: 2-(1-adamantyl)-1-(4-methylphenyl)ethanone
• 化学式: C₁₉H₂₄O
• mdl: MFCD01838656
• 分子量: 268.4
• InChiKey: WFEOPMRUZYHQBX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.4
• 重原子数：
  20
• 可旋转键数：
  3
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.63
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• PROCESS FOR PRODUCING PHOTORESIST PATTERN AND PHOTORESIST COMPOSITION
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20170329224A1

  公开（公告）日：2017-11-16

  A process for producing a photoresist pattern comprising steps (1) to (5); (1) applying a photoresist composition onto a substrate, said photoresist composition comprising an acid generator and a resin which comprises a structural unit having an acid-liable group; (2) drying the applied composition to form a composition layer; (3) exposing the composition layer; (4) heating the exposed composition layer; and (5) developing the heated composition layer with a developer which comprises butyl acetate, wherein a distance of Hansen solubility parameters between the resin and butyl acetate is from 3.3 to 4.3, the distance is calculated from formula (1): R =(4×(δ d R −15.8) 2 +(δ p R −3.7) 2 +(δ h R −6.3) 2 ) 1/2 (1) in which δd R represents a dispersion parameter of the resin, δp R represents a polarity parameter of the resin, δh R represents a hydrogen bonding parameter of the resin, and R represents the distance, and a film retention ratio of the photoresist pattern relative to the composition layer is adjusted to 65% or more.