Hydroxymethyl 2-hydroxy-2-methylpropionate

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: Hydroxymethyl 2-hydroxy-2-methylpropionate
• 英文别名: 2-hydroxyethyl 2-hydroxy-2-methylpropanoate
• 化学式: C₆H₁₂O₄
• 分子量: 148.16
• InChiKey: BFHVMCRMQYLPQW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.6
• 重原子数：
  10
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  66.8
• 氢给体数：
  2
• 氢受体数：
  4

文献信息

• MONOMER FOR FORMING ORGANIC ANTI-REFLECTIVE COATING LAYER, POLYMER THEREOF AND COMPOSITION INCLUDING THE SAME
  申请人：KIM Sang-Jeoung

  公开号：US20080131815A1

  公开（公告）日：2008-06-05

  A monomer for forming an organic anti-reflective coating layer, a polymer thereof and a composition including the same are disclosed. In a photolithography process, the organic anti-reflective coating layer absorbs an exposed light between a layer to be etched and a photoresist layer, and prevents a photoresist pattern from collapsing due to a standing wave generated under the photoresist layer. The polymer for forming an organic anti-reflective coating layer includes a repeating unit represented by Formula wherein, R 1 is a hydrogen atom, a methyl group or an ethyl group, R 2 is a C 1 ˜C 20 alkylene group, a C 3 ˜C 20 cycloalkylene group or a C 6 ˜C 20 aromatic hydrocarbon group, POSS is a polyhedral-oligomeric-silsesquioxane, and m is an integer of 2 to 110.
• TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170298186A1

  公开（公告）日：2017-10-19

  The present invention provides a tetracarboxylic acid diester compound shown by the following general formula (1), wherein X 1 represents a tetravalent organic group; and R 1 represents a group shown by the following general formula (2), wherein the dotted line represents a bond; Y 1 represents an organic group with a valency of k+1; “k” represents 1 or 2; and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound that can give a polyimide precursor polymer soluble in a safe organic solvent widely used as a solvent of a composition and usable as a base resin of a photosensitive resin composition.
• US7629110B2
  申请人：——

  公开号：US7629110B2

  公开（公告）日：2009-12-08