3-cis-Methoxy-2-cis-methyl-1R-cyclohexanol

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 3-cis-Methoxy-2-cis-methyl-1R-cyclohexanol
• 英文别名: 3-methoxy-2-methylcyclohexan-1-ol
• 化学式: C₈H₁₆O₂
• 分子量: 144.21
• InChiKey: OPRVBBHGLPMGIV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.2
• 重原子数：
  10
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  29.5
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Harada Yukako

  公开号：US20080081293A1

  公开（公告）日：2008-04-03

  The present invention provides a salt represented by the formula (I): wherein P 1 , P 2 and P 3 each independently represent a C1-C30 alkyl group which may be substituted with at least one selected from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-C12 alkoxy group, or a C3-C30 cyclic hydrocarbon group which may be substituted with at least one selected from a hydroxyl group and a C1-C12 alkoxy group, provided that all of P 1 , P 2 and P 3 are not simultaneously phenyl groups which may be substituted, Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and R represents a group represented by the formula: wherein A 1 represents —OH or —Y 1 —OH, n represents an integer of 1 to 9, and Y 1 represents a divalent C1-C6 saturated aliphatic hydrocarbon group; a group represented by the formula: wherein ring X 1 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which one —CH 2 — group is substituted with —CO—, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group; a group represented by the formula: wherein ring X 2 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which a hydrogen atom of one —CH 2 — group is substituted with a hydroxyl group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group; a group represented by the formula: wherein ring X 3 represents a C3-C30 monocyclic or polycyclic hydrocarbon group in which one —CH 2 — group is substituted with —COO—, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group, and m represents an integer of 0 to 12; or a group represented by the formula: wherein ring X 4 represents a C6-C30 polycyclic hydrocarbon group having tricycle or more, and at least one hydrogen atom in the polycyclic hydrocarbon group may be substituted with a C1-C6 alkyl group, a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group or a cyano group, and l represents an integer of 1 to 12. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

  本发明提供了一种盐，其表示为公式（I）：其中P1、P2和P3各自独立地表示一个C1-C30烷基基团，该基团可以被至少一个羟基、一个C3-C12环烃基团和一个C1-C12烷氧基中的至少一个取代，或者一个C3-C30环烃基团，该基团可以被至少一个羟基和一个C1-C12烷氧基中的至少一个取代，前提是P1、P2和P3均不同时为可以被取代的苯基；Q1和Q2各自独立地表示氟原子或者C1-C6全氟烷基基团，R表示由以下公式表示的一个基团：其中A1表示—OH或—Y1—OH，n表示1到9之间的整数，Y1表示二价的C1-C6饱和脂肪族碳氢基团；一个由以下公式表示的基团：其中环X1表示一个C3-C30的单环或多环碳氢基团，其中一个—CH2—基团被—CO—取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代；一个由以下公式表示的基团：其中环X2表示一个C3-C30的单环或多环碳氢基团，其中一个— —基团的氢原子被羟基取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代；一个由以下公式表示的基团：其中环X3表示一个C3-C30的单环或多环碳氢基团，其中一个— —基团被—COO—取代，并且单环或多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团、羟基或氰基取代，m表示0到12之间的整数；或者一个由以下公式表示的基团：其中环X4表示一个具有三环或更多的C6-C30多环碳氢基团，多环碳氢基团中的至少一个氢原子可以被C1-C6烷基基团、C1-C6烷氧基、C1-C4全氟烷基基团、C1-C6羟基烷基基团或氰基取代，l表示1到12之间的整数。本发明还提供了一种化学增感抗蚀组合物，其包含上述公式（I）表示的盐。
• CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
  申请人：Kamabuchi Akira

  公开号：US20090286937A1

  公开（公告）日：2009-11-19

  The present invention provides a chemically amplified positive composition comprising a resin which comprises a structural unit having an acid-labile group in a side chain and a structural unit represented by the formula (I): wherein R 1 represents a hydrogen atom etc., R′ and R″ are independently a hydrogen atom etc., k represents an integer of 1 to 12, R is independently a C1-C6 alkyl group etc. and x represents an integer of 0 to 7, and an acid generator represented by the formula (V): wherein Y 1 and Y 2 each independently represent a fluorine atom etc., R12 represents a C1-C30 linear, branched chain or cyclic hydrocarbon group which may be substituted, and A + represents an organic counter ion.

  本发明提供了一种化学增感正性组合物，包括一个树脂，该树脂包括一个侧链中含有酸敏感基团的结构单元和一个由式(I)表示的结构单元：其中R1代表氢原子等，R'和R"各自独立地代表氢原子等，k表示1到12的整数，R独立地代表C1-C6烷基等，x表示0到7的整数，以及由式(V)表示的酸发生剂：其中Y1和Y2各自独立地代表氟原子等，R12代表C1-C30线性、支链或环烃基，可以被取代，A+代表有机对离子。
• CHEMICALLY AMPLIFIED RESIST COMPOSITION
  申请人：YAMAGUCHI Satoshi

  公开号：US20080220369A1

  公开（公告）日：2008-09-11

  The present invention provides a chemically amplified resist composition containing: (A) a salt represented by the formula (I): A +− O 3 S-Q 1 (I) wherein A+ and Q 1 are defined in the specification; (B) a salt represented by the formula (II): wherein R 22 , A 3 , A 4 and A′ + are defined in the specification; and (C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.
• POLYMER AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE SAME
  申请人：FUJI Yusuke

  公开号：US20090264565A1

  公开（公告）日：2009-10-22

  The present invention provides a polymer comprising a structural unit represented by the formula (Ia) or (Ib): wherein R 1 represents a hydrogen atom etc., R 2 represents a linear, branched chain or cyclic C1-C8 alkyl group, R 3 represents a methyl group, n represents an integer of 0 to 14, Z 1 represents a single bond etc., k represents an integer of 1 to 4, R 4 and R 5 each independently represents a hydrogen atom etc., and m represents an integer of 1 to 3, a structural unit represented by the formula (II): wherein R 6 and R 7 each independently represents a hydrogen atom etc., R 8 represents a methyl group, R 9 represents a hydrogen atom etc., Z 2 represents a single bond etc., k′ represents an integer of 1 to 4, Z′ represents a group capable to eliminate by an action of an acid, and a structural unit represented by the formula (III): wherein R 10 represents a carboxyl group etc., l′ represents an integer of 0 to 3, Z 3 represents a single bond etc., and k″ represents an integer of 1 to 4.
• Polymer and Resist Composition Comprising the Same
  申请人：ANDO Nobuo

  公开号：US20100081085A1

  公开（公告）日：2010-04-01

  A polymer comprising a structural unit represented by the formula (I): wherein R 1 represents a hydrogen atom or a methyl group, R 2 is independently in each occurrence a linear or branched chain C1-C6 alkyl group, k represents an integer of 0 to 4, X represents a linear or branched chain C1-C6 alkylene group, Z represents a 2-adamantyl group which may have one or more substituents, and a structural unit represented by the formula (II): wherein R 4 represents a hydrogen atom or a methyl group, R 5 is independently in each occurrence a linear or branched chain C1-C6 alkyl group and n represents an integer of 0 to 4.