Acetic acid, 4-methyl-2-oxotetrahydropyran-4-yl ester

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: Acetic acid, 4-methyl-2-oxotetrahydropyran-4-yl ester
• 英文别名: (4-methyl-2-oxooxan-4-yl) acetate
• 化学式: C₈H₁₂O₄
• 分子量: 172.18
• InChiKey: UISGYVLMJZLIIC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.3
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.75
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• PHOTOSENSITIVE POLYMER AND PHOTORESIST COMPOSITION
  申请人：KIM Deog-Bae

  公开号：US20080057436A1

  公开（公告）日：2008-03-06

  A photosensitive polymer which can form a fine circuit pattern by exacting with extreme UV and deep UV, and can improve a line width stability of a pattern by significantly reducing line edge roughness after developing, and a photoresist composition including the same are disclosed. The photosensitive polymer for extreme UV and deep UV includes a repeating unit represented by the following Formula 1, in Formula 1, R 1 and R 1 ′ are independently a hydrogen atom, methyl group, or trifluoromethyl group, and R 2 is wherein Ra and Rb are independently alkyl group of 1 to 10 carbon atoms, aryl group of 6 to 10 carbon atoms, or arylalkyl group of 7 to 12 carbon atoms, and can be connected together to form ring, and a and b are mol % of each repeating unit with respect to the total repeating unit constituting the photosensitive polymer, and are 1 to 99 mol % and 1 to 99 mol % respectively.
• US7504195B2
  申请人：——

  公开号：US7504195B2

  公开（公告）日：2009-03-17