申请人:Hoffmann-La Roche Inc.
公开号:US04147875A1
公开(公告)日:1979-04-03
Compounds are disclosed of the formula ##STR1## wherein R.sub.1 is hydrogen, halogen or trifluoromethyl; R.sub.2 is selected from the group consisting of lower alkylthio together with the sulfoxide and sulfone thereof, halo, lower alkylamino or lowe alkoxy; Y is oxo or thio; R.sub.3 is selected from the group consisting of hydrogen, --COOR.sub.4 wherein R.sub.4 is hydrogen or lower alkyl, --CONR.sub.6 R.sub.5 wherein R.sub.5 and R.sub.6 are hydrogen or lower alkyl; X is hydrogen or halogen; and R.sub.7 is lower alkyl or hydrogen And the pharmaceutically acceptable salts and N-oxides thereof. Also presented are processes to produce the above compounds and intermediates therefor and derivatives thereof.
本文揭示了以下化合物的公式:##STR1## 其中 R.sub.1 是氢、卤素或三氟甲基;R.sub.2 选自较低烷基硫醇、其亚砜和磺酮、卤素、较低烷基氨基或较低烷氧基的群体;Y 是氧或硫;R.sub.3 选自氢、--COOR.sub.4,其中 R.sub.4 是氢或较低烷基,--CONR.sub.6 R.sub.5,其中 R.sub.5 和 R.sub.6 是氢或较低烷基;X 是氢或卤素;R.sub.7 是较低烷基或氢;以及其药学上可接受的盐和 N-氧化物。还提供了制备上述化合物和中间体及其衍生物的方法。