1-Amino-1-ethoxyethanol;2,3,5-tris(aziridin-1-yl)cyclohexa-2,5-diene-1,4-dione

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 1-Amino-1-ethoxyethanol;2,3,5-tris(aziridin-1-yl)cyclohexa-2,5-diene-1,4-dione
• 英文别名: 1-amino-1-ethoxyethanol;2,3,5-tris(aziridin-1-yl)cyclohexa-2,5-diene-1,4-dione
• 化学式: C16H24N4O4
• 分子量: 336.39
• InChiKey: ZHHQVFURPGKFBP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -1.17
• 重原子数：
  24
• 可旋转键数：
  5
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  98.6
• 氢给体数：
  2
• 氢受体数：
  8

文献信息

• [EN] METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD<br/>[FR] PROCÉDÉ DE FORMATION DE MOTIF ET COMPOSITION DE RÉSINE SENSIBLE À UN RAYONNEMENT OU AUX RAYONS ACTINIQUES POUR UTILISATION DANS LE PROCÉDÉ
  申请人：FUJIFILM CORP

  公开号：WO2014003206A1

  公开（公告）日：2014-01-03

  Provided is a method of forming a pattern, including forming a film comprising an actinic-ray- or radiation-sensitive resin composition comprising, resin (A) comprising any of repeating units of general formula (I) below, which resin when acted on by an acid, decreases its solubility in a developer comprising an organic solvent, and a compound (B) expressed by any of general formulae (B-1) to (B-3) below, which compound when exposed to actinic rays or radiation, generates an acid, exposing the film to actinic rays or radiation, and developing the exposed film with a developer comprising an organic solvent to thereby obtain a negative pattern.