2,7,7-trimethyl-6,7a-dihydro-5H-inden-4-one

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2,7,7-trimethyl-6,7a-dihydro-5H-inden-4-one
• 化学式: C₁₂H₁₆O
• 分子量: 176.25
• InChiKey: BKHOKPPRDOHUFA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  13
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.58
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION, AND ELECTRONIC DEVICE PRODUCING METHOD AND ELECTRONIC DEVICE<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE À UN RAYONNEMENT OU SENSIBLE AUX RAYONS ACTINIQUES, FILM SENSIBLE À UN RAYONNEMENT OU SENSIBLE AUX RAYONS ACTINIQUES ET PROCÉDÉ FORMANT MOTIF UTILISANT LA COMPOSITION ET PROCÉDÉ DE PRODUCTION DE DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE
  申请人：FUJIFILM CORP

  公开号：WO2014017408A1

  公开（公告）日：2014-01-30

  An actinic ray-sensitive or radiation-sensitive resin composition with few pattern collapse, which has an excellent pattern roughness property such as exposure latitude and LWR, and of which the performance over time do not fluctuate much, contains a compound represented by the following general formula (1). The respective symbols in the general formula represent the meanings described in claims.