2-(1,2,2,3,3,4,4,5-Octafluorocyclopentyl)ethanol

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 2-(1,2,2,3,3,4,4,5-Octafluorocyclopentyl)ethanol
• 英文别名: 2-(1,2,2,3,3,4,4,5-octafluorocyclopentyl)ethanol
• 化学式: C₇H₆F₈O
• 分子量: 258.11
• InChiKey: UPULEFPMERWBAR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  16
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  9

文献信息

• Composition for Forming Films, Film Produced from Said Composition, and Method for Producing Organic Semiconductor Element Using Said Composition
  申请人：CENTRAL GLASS COMPANY, LIMITED

  公开号：US20160164047A1

  公开（公告）日：2016-06-09

  A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the formula (1) and a repeating unit of the general formula (2); and a fluorine-containing solvent. In the general formula (2), R 1 represents a C 1 -C 15 straight, C 3 -C 15 branched or C 3 -C 15 cyclic hydrocarbon group in which at least one hydrogen atom may be replaced by a fluorine atom or chlorine atom and which may have a hydroxy group. This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element as the composition can form a fluororesin film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.
• Film-Forming Composition, Film Formed Thereby, and Method for Manufacturing Organic Semiconductor Element Using Same
  申请人：CENTRAL GLASS COMPANY, LIMITED

  公开号：US20160181531A1

  公开（公告）日：2016-06-23

  A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the general formula (1); and a fluorine-containing solvent. In the general formula (1), R 1 each independently represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; and R 2 each independently represents a C 1 -C 15 straight, C 3 -C 15 branched or C 3 -C 15 cyclic fluorine-containing hydrocarbon group in which any hydrogen atom may be replaced by a fluorine atom with the proviso that the repeating unit contains at least one fluorine atom; and This film-forming composition is suitably usable for the manufacturing of an organic semiconductor element because the composition can form a film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.
• US9842993B2
  申请人：——

  公开号：US9842993B2

  公开（公告）日：2017-12-12
• US9966575B2
  申请人：——

  公开号：US9966575B2

  公开（公告）日：2018-05-08