6-Ethyl-2-methyldecane-3,5-dione;2-methyldecane-4,6-dione

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 6-Ethyl-2-methyldecane-3,5-dione;2-methyldecane-4,6-dione
• 英文别名: 6-ethyl-2-methyldecane-3,5-dione;2-methyldecane-4,6-dione
• 化学式: C24H44O4
• 分子量: 396.6
• InChiKey: YPRIKQJIWPNKNQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.14
• 重原子数：
  28
• 可旋转键数：
  15
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  68.3
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• THIN-FILM-FORMING MATERIAL INCLUDING A MOLYBDENUM IMIDE COMPOUND
  申请人：ADEKA CORPORATION

  公开号：US20170253624A1

  公开（公告）日：2017-09-07

  In the method of the present invention for producing a thin film, including introducing, onto a substrate, a vapor that has been obtained by vaporizing a thin-film-forming material including a molybdenum imide compound represented by the following formula (I) and that includes the molybdenum imide compound; and then forming a thin film including molybdenum on the substrate by decomposing and/or chemically reacting the molybdenum imide compound. (In the formula, R 1 though R 10 each represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, and R 11 represents a linear or branched alkyl group having 1 to 8 carbon atoms.)

  在本发明的制备薄膜的方法中，包括引入一种蒸汽到基片上，该蒸汽是通过蒸发包括以下式（I）所表示的钼酰亚胺化合物的薄膜形成材料而获得的，并且包括该钼酰亚胺化合物；然后通过分解和/或化学反应该钼酰亚胺化合物，在基片上形成包括钼的薄膜。（在该式中，R1到R10各代表氢原子或具有1至5个碳原子的线性或支链烷基，R11代表具有1至8个碳原子的线性或支链烷基。）
• Molybdenum imide compound
  申请人：ADEKA CORPORATION

  公开号：US10150789B2

  公开（公告）日：2018-12-11

  In the method of the present invention for producing a thin film, including introducing, onto a substrate, a vapor that has been obtained by vaporizing a thin-film-forming material including a molybdenum imide compound represented by the following formula (I) and that includes the molybdenum imide compound; and then forming a thin film including molybdenum on the substrate by decomposing and/or chemically reacting the molybdenum imide compound. (In the formula, R1 though R10 each represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, and R11 represents a linear or branched alkyl group having 1 to 8 carbon atoms).

  在本发明的薄膜生产方法中，包括在基底上引入蒸汽，该蒸汽是通过汽化包括由下式（I）表示的亚钼化合物在内的薄膜形成材料而获得的，其中包括亚钼化合物；然后通过分解和/或化学反应亚钼化合物，在基底上形成包括钼的薄膜。 (式中，R1 和 R10 分别代表氢原子或具有 1 至 5 个碳原子的直链或支链烷基，R11 代表具有 1 至 8 个碳原子的直链或支链烷基）。
• METHOD FOR MANUFACTURING MOLYBDENUM OXIDE-CONTAINING THIN FILM, STARTING MATERIAL FOR FORMING MOLYBDENUM OXIDE-CONTAINING THIN FILM, AND MOLYBDENUM AMIDE COMPOUND
  申请人：Sato Hiroki

  公开号：US20140141165A1

  公开（公告）日：2014-05-22

  Disclosed is a method for manufacturing a molybdenum oxide-containing thin film, involving vaporizing a starting material for forming a thin film containing a compound represented by the following general formula (I) to give vapor containing a molybdenum amide compound, introducing the obtained vapor onto a substrate, and further introducing an oxidizing gas to cause decomposition and/or a chemical reaction to form a thin film on the substrate. In the formula, R 1 and R 2 each represents a straight or branched alkyl group having 1 to 4 carbon atom(s), R 3 represents a t-butyl group or a t-amyl group, y represents 0 or 2, x is 4 when y is 0, or x is 2 when y is 2, wherein R 1 and R 2 that are plurally present may be the same or different.
• METHOD FOR PRODUCING THIN FILM CONTAINING MOLYBDENUM, THIN-FILM-FORMING MATERIAL, AND MOLYBDENUM IMIDE COMPOUND
  申请人：ADEKA CORPORATION

  公开号：US20150203521A1

  公开（公告）日：2015-07-23

  In the method of the present invention for producing a thin film, including introducing, onto a substrate, a vapor that has been obtained by vaporizing a thin-film-forming material including a molybdenum imide compound represented by the following formula (I) and that includes the molybdenum imide compound; and then forming a thin film including molybdenum on the substrate by decomposing and/or chemically reacting the molybdenum imide compound. (In the formula, R 1 though R 10 each represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, and R 11 represents a linear or branched alkyl group having 1 to 8 carbon atoms.)
• METHOD FOR MANUFACTURING MOLYBDENUM OXIDE-CONTAINING THIN FILM
  申请人：ADEKA CORPORATION

  公开号：US20150371859A1

  公开（公告）日：2015-12-24

  Disclosed is a method for manufacturing a molybdenum oxide-containing thin film, involving vaporizing a starting material for forming a thin film containing a compound represented by the following general formula (I) to give vapor containing a molybdenum amide compound, introducing the obtained vapor onto a substrate, and further introducing an oxidizing gas to cause decomposition and/or a chemical reaction to form a thin film on the substrate. In the formula, R 1 and R 2 each represents a straight or branched alkyl group having 1 to 4 carbon atom(s), R 3 represents a t-butyl group or a t-amyl group, y represents 0 or 2, x is 4 when y is 0, or x is 2 when y is 2, wherein R 1 and R 2 that are plurally present may be the same or different.