Hexanal;phenol

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: Hexanal;phenol
• 英文别名: hexanal;phenol
• 化学式: C12H18O2
• 分子量: 194.27
• InChiKey: JOCFXERJCAIUNL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.16
• 重原子数：
  14
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.42
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• [EN] METHANOFULLERENES<br/>[FR] MÉTHANOFULLERRÈNES
  申请人：ROBINSON ALEX PHILIP GRAHAM

  公开号：WO2014078097A1

  公开（公告）日：2014-05-22

  The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

  本公开涉及新型甲烷富勒烯衍生物，由此制备的负型光刻胶组合物以及使用它们的方法。这些衍生物，它们的光刻胶组合物和方法非常适合使用紫外线辐射、超过极紫外线辐射、极紫外线辐射、X射线和带电粒子射线等技术进行精细图案处理。
• [EN] METHANOFULLERENES<br/>[FR] MÉTHANOFULLERÈNES
  申请人：ROBINSON ALEX PHILIP GRAHAM

  公开号：WO2014137663A1

  公开（公告）日：2014-09-12

  The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.

  本公开涉及新型甲烷富勒烯衍生物，制备其负型光阻组合物和使用它们的方法。这些衍生物、它们的光阻组合物和方法非常适合使用紫外线辐射、超过极紫外线辐射、极紫外线辐射、X射线和带电粒子射线进行精细图案处理。还公开了负光敏组合物。
• Multiple trigger photoresist compositions and methods
  申请人：Robinson Alex Phillip Graham

  公开号：US10095112B2

  公开（公告）日：2018-10-09

  The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

  本公开涉及新型多触发阴性工作光刻胶组合物和工艺。这些工艺包括在第一步中去除交联官能团上的酸标签保护基团，在第二步中用酸敏感交联剂交联交联官能团。在光刻胶催化链中加入多重触发途径可增加接受低剂量辐照区域的化学梯度，有效地起到内置剂量依赖性淬火器-模拟器的作用，从而提高化学梯度，进而提高分辨率、分辨率模糊度和曝光宽容度。光刻胶组合物和方法非常适合使用紫外线辐射、超强紫外线辐射、极紫外线辐射、X 射线和带电粒子射线等进行精细图案处理。
• METHANOFULLERENES
  申请人：Robinson, Alex Philip, Graham

  公开号：EP2920142A1

  公开（公告）日：2015-09-23
• Composition of Matter and Molecular Resist Made Therefrom
  申请人：Robinson Alex Philip Graham

  公开号：US20150140489A1

  公开（公告）日：2015-05-21

  Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R 1 is a saturated or unsaturated group having from 1-4 carbon atoms, R 2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R 3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R 4 is a saturated or unsaturated group having from 1-4 carbon atoms.