4-Methyl-4-propoxypentan-2-amine

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: 4-Methyl-4-propoxypentan-2-amine
• 英文别名: 4-methyl-4-propoxypentan-2-amine
• 化学式: C₉H₂₁NO
• 分子量: 159.27
• InChiKey: AHOOVSDAHVYALQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  11
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  35.2
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• Process for preparing a polyetheramine
  申请人：BASF SE

  公开号：US10414716B2

  公开（公告）日：2019-09-17

  A process for producing a polyetheramine by reacting a polyether alcohol, previously synthesized in the presence of a basic potassium or sodium compound as catalyst, with ammonia in the presence of hydrogen and a catalyst in one reactor or a plurality of reactors, wherein the employed polyether alcohol when previously synthesized in the presence of a basic potassium compound as catalyst has a content of potassium ions of less than 50 wppm and when previously synthesized in the presence of a basic sodium compound as catalyst has a content of sodium ions of less than 50 wppm.

  一种生产聚醚胺的工艺，其方法是在一个反应器或多个反应器中，在氢气和催化剂存在下，使先前在碱性钾或钠化合物作为催化剂存在下合成的聚醚醇与氨反应、其中所使用的聚醚醇，当以前在碱性钾化合物作为催化剂存在下合成时，其钾离子含量小于 50 wppm，当以前在碱性钠化合物作为催化剂存在下合成时，其钠离子含量小于 50 wppm。
• FLEXIBLE POLYUREA SEALANT COMPOSITIONS
  申请人：Covestro LLC

  公开号：US20170298171A1

  公开（公告）日：2017-10-19

  Disclosed are polyurea compositions and methods for using such composition as sealants, such as construction sealants.
• PROCESS FOR PREPARING A POLYETHERAMINE
  申请人：BASF SE

  公开号：US20170362164A1

  公开（公告）日：2017-12-21

  A process for producing a polyetheramine by reacting a polyether alcohol, previously synthesized in the presence of a basic potassium or sodium compound as catalyst, with ammonia in the presence of hydrogen and a catalyst in one reactor or a plurality of reactors, wherein the employed polyether alcohol when previously synthesized in the presence of a basic potassium compound as catalyst has a content of potassium ions of less than 50 wppm and when previously synthesized in the presence of a basic sodium compound as catalyst has a content of sodium ions of less than 50 wppm.
• COMPOSITION AND METHOD FOR SILICON NITRIDE CMP
  申请人：Cabot Microelectronics Corporation

  公开号：US20200172761A1

  公开（公告）日：2020-06-04

  The invention provides a chemical-mechanical polishing composition for polishing a silicon nitride containing substrate. The composition includes an aqueous carrier; cationic silica particles dispersed in the aqueous carrier, the cationic silica abrasive particles having a zeta potential of at least 10 mV in the polishing composition; a polishing additive selected from the group consisting of a polyether amine, a polysilamine, a polyvinylimidazole, and a combination thereof, wherein the polyether amine and the polysilamine have corresponding weight average molecular weights of about 1,000 g/mol or less. The composition has a pH of greater than about 6. A method for polishing a silicon nitride containing substrate is also provided.
• AN ADDITIVE COMPOSITION AND APPLICATION THEREOF
  申请人：BASF SE

  公开号：US20200369809A1

  公开（公告）日：2020-11-26

  The present invention relates to an additive composition for abatement of free aldehydes, particularly formaldehyde, or removing the same in the air, comprising—a polymer of acetoacetyl functional ethylenically unsaturated monomer, which contains at least 70 wt % of at least one acetoacetyl functional ethylenically unsaturated monomer, and 0 to 30 wt % of at least one ethylenically unsaturated monomer other than the acetoacetyl functional ethylenically unsaturated monomer, based on the total weight of all monomer(s), and—optionally, at least one amine, and to an interior coating composition comprising the additive composition.