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4-(2-Bicyclo[2.2.1]hept-5-enyl)-1,1,1-trifluoro-2-methylbutan-2-ol

中文名称
——
中文别名
——
英文名称
4-(2-Bicyclo[2.2.1]hept-5-enyl)-1,1,1-trifluoro-2-methylbutan-2-ol
英文别名
4-(2-bicyclo[2.2.1]hept-5-enyl)-1,1,1-trifluoro-2-methylbutan-2-ol
4-(2-Bicyclo[2.2.1]hept-5-enyl)-1,1,1-trifluoro-2-methylbutan-2-ol化学式
CAS
——
化学式
C12H17F3O
mdl
——
分子量
234.26
InChiKey
MVCQJZXEAMFUJA-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.5
  • 重原子数:
    16
  • 可旋转键数:
    3
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.83
  • 拓扑面积:
    20.2
  • 氢给体数:
    1
  • 氢受体数:
    4

文献信息

  • Fluorine free photopatternable phenol functional group containing polymer compositions
    申请人:PROMERUS, LLC
    公开号:US10303057B2
    公开(公告)日:2019-05-28
    Various polycycloolefinic polymers containing phenolic pendent groups and compositions thereof useful for forming self-imageable films encompassing such polymers are disclosed. Such polymers encompass norbornene-type repeating units containing phenolic pendent groups which contain very low levels of fluorine containing monomers. The films formed from such polymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.
    本发明公开了各种含酚醛悬垂基团的聚环烯烃聚合物及其用于形成包含此类聚合物的自成像薄膜的组合物。此类聚合物包含降冰片烯类重复单元,其中含有含氟单体含量极低的酚醛悬垂基团。由此类聚合物组合物形成的薄膜具有自成像、低 K 值、热稳定的特性,可用于微电子和光电设备。
  • NANOPOROUS FILMS DERIVED FROM POLYCYCLO-OLEFINIC BLOCK POLYMERS
    申请人:PROMERUS, LLC
    公开号:US20170015790A1
    公开(公告)日:2017-01-19
    A nanoporous film formed from a series of vinyl addition block polymers derived from functionalized norbornene monomers are disclosed and claimed. The nanoporous films as disclosed herein are useful as pervaporation membranes and antireflective coatings among various other uses. Also disclosed herein are the fabrication of nanoporous films into pervaporation membranes which exhibit unique separation properties, and their use in the separation of organic volatiles from biomass and/or organic waste, including butanol, phenol, and the like. The fabrication of nanoporous films into antireflective coatings are also disclosed.
  • FLUORINE FREE PHOTOPATTERNABLE PHENOL FUNCTIONAL GROUP CONTAINING POLYMER COMPOSITIONS
    申请人:PROMERUS, LLC
    公开号:US20170097566A1
    公开(公告)日:2017-04-06
    Various polycycloolefinic polymers containing phenolic pendent groups and compositions thereof useful for forming self-imageable films encompassing such polymers are disclosed. Such polymers encompass norbornene-type repeating units containing phenolic pendent groups which contain very low levels of fluorine containing monomers. The films formed from such polymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.
  • NADIC ANHYDRIDE POLYMERS AND PHOTOSENSITIVE COMPOSITIONS DERIVED THEREFROM
    申请人:PROMERUS, LLC
    公开号:US20180030189A1
    公开(公告)日:2018-02-01
    Various vinyl addition polymers of nadic anhydride are disclosed. Examples of such polymers include copolymers and terpolymers of nadic anhydride with a wide variety of norbornene-type monomers. The nadic anhydride polymers are found to be useful in forming a wide variety of photosensitive compositions, both positive and negative, which are capable of forming high resolution imageable films exhibiting excellent dielectric properties (low-k) and thermal properties, and thus are useful in the fabrication of a variety of microelectronic and optoelectronic devices, among others.
  • US8753790B2
    申请人:——
    公开号:US8753790B2
    公开(公告)日:2014-06-17
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